P‐7.5: Analysis and research on the improvement of OPC compensation aperture ratio

In this paper, we aim to improve the opening rate of color film substrate by proximity exposure mechanism, and carry out OPC (Optical Proximity Correction) at the corners of the pattern on the photo mask version, and DOE (design of experiments) to verify the optimal solution under the existing equip...

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Bibliographic Details
Published in:SID International Symposium Digest of technical papers 2023-04, Vol.54 (S1), p.712-714
Main Authors: ZHONG, Guoqiang, TANG, Wenhao, ZHANG, Ran, WANG, Yongcan, WANG, Zhangtao, SHAO, Xibin, CHEN, Jian, SHI, Shenwei, LIU, Zhenyi
Format: Article
Language:English
Subjects:
Color
Color film
OPC
Opening rate
Proximity Exposure
Substrates
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Summary:In this paper, we aim to improve the opening rate of color film substrate by proximity exposure mechanism, and carry out OPC (Optical Proximity Correction) at the corners of the pattern on the photo mask version, and DOE (design of experiments) to verify the optimal solution under the existing equipment and process conditions. The final result is that the color film black matrix pattern is closer to the design, and the substrate opening rate is increased by 1‐4%, which increases the product transmission rate and enhances the competitiveness of the product.
ISSN:0097-966X
2168-0159
DOI:10.1002/sdtp.16392