20.2: Invited Paper: Fast and Robust High Precision Luminance Image Stitching in Uniformity and DeMURA measurements

This paper provides an overview of image stitching and its general advantages and challenges. Further, we introduce a novel stitching concept based on our advanced pixel registration (APR) procedure. It allows easy and comparable flexible stitching setups for DeMURA and uniformity measurements in la...

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Bibliographic Details
Published in:SID International Symposium Digest of technical papers 2023-04, Vol.54 (S1), p.153-156
Main Authors: Rotscholl, Ingo, Liu, Bob, Krüger, Udo
Format: Article
Language:English
Subjects:
BlackMURA
DeMURA
display calibration
display metrology
image stitching
inspection
photometry
Pixel level luminance
Stitching
uniformity
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Description
Summary:This paper provides an overview of image stitching and its general advantages and challenges. Further, we introduce a novel stitching concept based on our advanced pixel registration (APR) procedure. It allows easy and comparable flexible stitching setups for DeMURA and uniformity measurements in laboratory and production environments.
ISSN:0097-966X
2168-0159
DOI:10.1002/sdtp.16250