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Role of surface morphological parameters on wettability of obliquely deposited Cu thin films in a plasma focus device
Correlation between surface statistical parameters obtained by atomic force microscopy (AFM) analysis such as root-mean-square roughness, correlation length, fractal dimension, as well as surface chemistry and wetting behavior of obliquely deposited copper thin films is investigated. Six samples wer...
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Published in: | Journal of materials research 2023-08, Vol.38 (15), p.3666-3676 |
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description | Correlation between surface statistical parameters obtained by atomic force microscopy (AFM) analysis such as root-mean-square roughness, correlation length, fractal dimension, as well as surface chemistry and wetting behavior of obliquely deposited copper thin films is investigated. Six samples were positioned at different angular locations with respect to anode axis during deposition process in a plasma focus device. Grazing incidence x-ray diffraction (GIXRD) analysis of the samples shows formation of cubic copper crystalline structure and Fourier transform infrared spectroscopy (FTIR) studies depicts presence of copper oxide. The morphological characterization reveals that the wettability of films obeys the Wenzel regime and the surface fractal dimension plays a key role in determination of the contact angle of surfaces. There is a similar behavioral trend for fractal dimension and water contact angle in the investigated samples. Findings of this study reflect the role of irregularity at short length scales in surface wettability.
Graphical Abstract
In order to investigate the effects of surface morphology on wettability properties of Cu on glass thin films, different samples were produced by Plasma Focus device. Samples positioned at different angular positions with respect to the anode axis in the PF device, showed different morphological characteristics. Although, surface chemical properties of the samples don’t differ according to surface composition analyses, surface morphology plays a dominant role in wettability determination. |
doi_str_mv | 10.1557/s43578-023-01090-x |
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Graphical Abstract
In order to investigate the effects of surface morphology on wettability properties of Cu on glass thin films, different samples were produced by Plasma Focus device. Samples positioned at different angular positions with respect to the anode axis in the PF device, showed different morphological characteristics. Although, surface chemical properties of the samples don’t differ according to surface composition analyses, surface morphology plays a dominant role in wettability determination.</description><identifier>ISSN: 0884-2914</identifier><identifier>EISSN: 2044-5326</identifier><identifier>DOI: 10.1557/s43578-023-01090-x</identifier><language>eng</language><publisher>Cham: Springer International Publishing</publisher><subject>Angular position ; Applied and Technical Physics ; Biomaterials ; Chemical properties ; Chemistry and Materials Science ; Contact angle ; Copper ; Copper oxides ; Focus devices ; Fourier transforms ; Fractal geometry ; Fractals ; Inorganic Chemistry ; Materials Engineering ; Materials research ; Materials Science ; Morphology ; Nanotechnology ; Parameters ; Plasma focus ; Thin films ; Wettability</subject><ispartof>Journal of materials research, 2023-08, Vol.38 (15), p.3666-3676</ispartof><rights>The Author(s), under exclusive licence to The Materials Research Society 2023. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c319t-384db972ffe9e8eb2b92f6dca0c8bab44e5364d95bbe6ee6c7f2fa61b110db563</citedby><cites>FETCH-LOGICAL-c319t-384db972ffe9e8eb2b92f6dca0c8bab44e5364d95bbe6ee6c7f2fa61b110db563</cites><orcidid>0000-0002-3898-2308</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Foadi, Farnaz</creatorcontrib><creatorcontrib>Etminan, Mahsa</creatorcontrib><creatorcontrib>Aghamir, Farzin M.</creatorcontrib><creatorcontrib>Mohammadizadeh, Mohammad R.</creatorcontrib><title>Role of surface morphological parameters on wettability of obliquely deposited Cu thin films in a plasma focus device</title><title>Journal of materials research</title><addtitle>Journal of Materials Research</addtitle><description>Correlation between surface statistical parameters obtained by atomic force microscopy (AFM) analysis such as root-mean-square roughness, correlation length, fractal dimension, as well as surface chemistry and wetting behavior of obliquely deposited copper thin films is investigated. Six samples were positioned at different angular locations with respect to anode axis during deposition process in a plasma focus device. Grazing incidence x-ray diffraction (GIXRD) analysis of the samples shows formation of cubic copper crystalline structure and Fourier transform infrared spectroscopy (FTIR) studies depicts presence of copper oxide. The morphological characterization reveals that the wettability of films obeys the Wenzel regime and the surface fractal dimension plays a key role in determination of the contact angle of surfaces. There is a similar behavioral trend for fractal dimension and water contact angle in the investigated samples. Findings of this study reflect the role of irregularity at short length scales in surface wettability.
Graphical Abstract
In order to investigate the effects of surface morphology on wettability properties of Cu on glass thin films, different samples were produced by Plasma Focus device. Samples positioned at different angular positions with respect to the anode axis in the PF device, showed different morphological characteristics. Although, surface chemical properties of the samples don’t differ according to surface composition analyses, surface morphology plays a dominant role in wettability determination.</description><subject>Angular position</subject><subject>Applied and Technical Physics</subject><subject>Biomaterials</subject><subject>Chemical properties</subject><subject>Chemistry and Materials Science</subject><subject>Contact angle</subject><subject>Copper</subject><subject>Copper oxides</subject><subject>Focus devices</subject><subject>Fourier transforms</subject><subject>Fractal geometry</subject><subject>Fractals</subject><subject>Inorganic Chemistry</subject><subject>Materials Engineering</subject><subject>Materials research</subject><subject>Materials Science</subject><subject>Morphology</subject><subject>Nanotechnology</subject><subject>Parameters</subject><subject>Plasma focus</subject><subject>Thin films</subject><subject>Wettability</subject><issn>0884-2914</issn><issn>2044-5326</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><recordid>eNp9kE1LxDAQhoMouK7-AU8Bz9UkTdrmKItfsCCInkOSTnazpJuatLr7762u4M3TzOF53hlehC4puaZC1DeZl6JuCsLKglAiSbE7QjNGOC9EyapjNCNNwwsmKT9FZzlvCKGC1HyGxpcYAEeH85ictoC7mPp1DHHlrQ6410l3MEDKOG7xJwyDNj74Yf-tRBP8-whhj1voY_YDtHgx4mHtt9j50GU8LRr3QedOYxftmCfyw1s4RydOhwwXv3OO3u7vXhePxfL54WlxuyxsSeVQlA1vjayZcyChAcOMZK5qrSa2MdpwDqKseCuFMVABVLZ2zOmKGkpJa0RVztHVIbdPcfo0D2oTx7SdTirWCCo5baScKHagbIo5J3CqT77Taa8oUd_1qkO9aqpX_dSrdpNUHqQ8wdsVpL_of6wvhqOBPw</recordid><startdate>20230814</startdate><enddate>20230814</enddate><creator>Foadi, Farnaz</creator><creator>Etminan, Mahsa</creator><creator>Aghamir, Farzin M.</creator><creator>Mohammadizadeh, Mohammad R.</creator><general>Springer International Publishing</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><orcidid>https://orcid.org/0000-0002-3898-2308</orcidid></search><sort><creationdate>20230814</creationdate><title>Role of surface morphological parameters on wettability of obliquely deposited Cu thin films in a plasma focus device</title><author>Foadi, Farnaz ; Etminan, Mahsa ; Aghamir, Farzin M. ; Mohammadizadeh, Mohammad R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c319t-384db972ffe9e8eb2b92f6dca0c8bab44e5364d95bbe6ee6c7f2fa61b110db563</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>Angular position</topic><topic>Applied and Technical Physics</topic><topic>Biomaterials</topic><topic>Chemical properties</topic><topic>Chemistry and Materials Science</topic><topic>Contact angle</topic><topic>Copper</topic><topic>Copper oxides</topic><topic>Focus devices</topic><topic>Fourier transforms</topic><topic>Fractal geometry</topic><topic>Fractals</topic><topic>Inorganic Chemistry</topic><topic>Materials Engineering</topic><topic>Materials research</topic><topic>Materials Science</topic><topic>Morphology</topic><topic>Nanotechnology</topic><topic>Parameters</topic><topic>Plasma focus</topic><topic>Thin films</topic><topic>Wettability</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Foadi, Farnaz</creatorcontrib><creatorcontrib>Etminan, Mahsa</creatorcontrib><creatorcontrib>Aghamir, Farzin M.</creatorcontrib><creatorcontrib>Mohammadizadeh, Mohammad R.</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of materials research</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Foadi, Farnaz</au><au>Etminan, Mahsa</au><au>Aghamir, Farzin M.</au><au>Mohammadizadeh, Mohammad R.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Role of surface morphological parameters on wettability of obliquely deposited Cu thin films in a plasma focus device</atitle><jtitle>Journal of materials research</jtitle><stitle>Journal of Materials Research</stitle><date>2023-08-14</date><risdate>2023</risdate><volume>38</volume><issue>15</issue><spage>3666</spage><epage>3676</epage><pages>3666-3676</pages><issn>0884-2914</issn><eissn>2044-5326</eissn><abstract>Correlation between surface statistical parameters obtained by atomic force microscopy (AFM) analysis such as root-mean-square roughness, correlation length, fractal dimension, as well as surface chemistry and wetting behavior of obliquely deposited copper thin films is investigated. Six samples were positioned at different angular locations with respect to anode axis during deposition process in a plasma focus device. Grazing incidence x-ray diffraction (GIXRD) analysis of the samples shows formation of cubic copper crystalline structure and Fourier transform infrared spectroscopy (FTIR) studies depicts presence of copper oxide. The morphological characterization reveals that the wettability of films obeys the Wenzel regime and the surface fractal dimension plays a key role in determination of the contact angle of surfaces. There is a similar behavioral trend for fractal dimension and water contact angle in the investigated samples. Findings of this study reflect the role of irregularity at short length scales in surface wettability.
Graphical Abstract
In order to investigate the effects of surface morphology on wettability properties of Cu on glass thin films, different samples were produced by Plasma Focus device. Samples positioned at different angular positions with respect to the anode axis in the PF device, showed different morphological characteristics. Although, surface chemical properties of the samples don’t differ according to surface composition analyses, surface morphology plays a dominant role in wettability determination.</abstract><cop>Cham</cop><pub>Springer International Publishing</pub><doi>10.1557/s43578-023-01090-x</doi><tpages>11</tpages><orcidid>https://orcid.org/0000-0002-3898-2308</orcidid></addata></record> |
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subjects | Angular position Applied and Technical Physics Biomaterials Chemical properties Chemistry and Materials Science Contact angle Copper Copper oxides Focus devices Fourier transforms Fractal geometry Fractals Inorganic Chemistry Materials Engineering Materials research Materials Science Morphology Nanotechnology Parameters Plasma focus Thin films Wettability |
title | Role of surface morphological parameters on wettability of obliquely deposited Cu thin films in a plasma focus device |
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