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Electron Diffraction Study of the Structural Changes in a Thin GeTe Crystal Exposed to High-Power Femtosecond Laser Radiation

The possibility of amorphization of a thin germanium telluride crystal irradiated by high-power 800-nm femtosecond laser pulses has been investigated. The sample was a 20-nm-thick film of crystalline semiconductor GeTe. An electron diffractometer with a source of short photoelectron pulses was used...

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Bibliographic Details
Published in:Bulletin of the Lebedev Physics Institute 2023-10, Vol.50 (Suppl 5), p.S552-S559
Main Authors: Mironov, B. N., Kochikov, I. V., Aseev, S. A., Ionin, V. V., Kiselev, A. V., Lotin, A. A., Chekalin, S. V., Ischenko, A. A., Ryabov, E. A.
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Language:English
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Summary:The possibility of amorphization of a thin germanium telluride crystal irradiated by high-power 800-nm femtosecond laser pulses has been investigated. The sample was a 20-nm-thick film of crystalline semiconductor GeTe. An electron diffractometer with a source of short photoelectron pulses was used to study the structural changes. The electron diffraction patterns were analyzed, and the α- and β- phases have been identified in GeTe. It is established that sample ablation occurs in the strong field of femtosecond laser pulses, which is accompanied by a decrease in the crystalline phase thickness to 5–6 nm without any significant amorphization of the sample. A specific feature of the observed process—the absence of light-induced transition of a thin GeTe film from the crystalline to the amorphous state under femtosecond laser irradiation—is noted. Possible causes of the revealed effect are discussed.
ISSN:1068-3356
1934-838X
DOI:10.3103/S1068335623170086