Facile preparation of UiO-66 derivatives for the removal of Co(II) from aqueous solution: study on adsorption properties and irradiation stability

In this study, hydroxyl and carboxyl group functionalized Zr-based MOFs UiO-66 derivatives (UiO-66-R: UiO-66-(OH) 2 and UiO-66-COOH) were prepared by a facile one-step method and used to remove Co(II) from simulated radioactive wastewater. The results showed that UiO-66-R have good adsorption proper...

Full description

Saved in:
Bibliographic Details
Published in:Journal of radioanalytical and nuclear chemistry 2023-10, Vol.332 (10), p.4047-4056
Main Authors: Yu, Yuying, Jiang, Dehai, He, Bai, Yu, Bo, Pu, Xiaoqin, Liu, Derong, Xiong, Wei, Liu, Ning, Yuan, Guoyuan
Format: Article
Language:English
Subjects:
Adsorption
Aqueous solutions
Carboxyl group
Chemisorption
Chemistry
Chemistry and Materials Science
Diagnostic Radiology
Hadrons
Heavy Ions
Inorganic Chemistry
Irradiation
Nuclear Chemistry
Nuclear Physics
Physical Chemistry
Stability
Wastewater
Zirconium
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:In this study, hydroxyl and carboxyl group functionalized Zr-based MOFs UiO-66 derivatives (UiO-66-R: UiO-66-(OH) 2 and UiO-66-COOH) were prepared by a facile one-step method and used to remove Co(II) from simulated radioactive wastewater. The results showed that UiO-66-R have good adsorption properties with maximum adsorption capacities of 133.3 mg L −1 (UiO-66-(OH) 2 ) and 125.6 mg L −1 (UiO-66-COOH). Furthermore, the Co(II) adsorption conforms to the pseudo-second-order kinetic model and Langmuir model, belonging to the single molecular layer chemisorption, and the adsorption processes are spontaneous and endothermic. XPS patterns illustrate that the coordination effect is crucial in determining the adsorption process of the two materials. To explore the irradiation stability, FT-IR, XRD and SEM were used to study the morphology and structure of materials after irradiation (20-80 kGy). The characterization analysis of UiO-66-R illustrated that UiO-66-(OH) 2 and UiO-66-COOH showed little change before and after irradiation, which indicated that both materials have good irradiation stability.
ISSN:0236-5731
1588-2780
DOI:10.1007/s10967-023-09114-w