Fabrication of CoFeB–SiO2 Films With Large Uniaxial Anisotropy by Facing Target Sputtering and its Application to High-Frequency Planar-Type Spiral Inductors

A comprehensive study on fabrication of CoFeB–SiO2 films with large in-plane magnetic anisotropy for the use in high-frequency inductors in power electronics circuits was conducted. The magnetic films were deposited using facing target sputtering (FTS), which can introduce large uniaxial magnetic an...

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Bibliographic Details
Published in:IEEE transactions on magnetics 2023-07, Vol.59 (11), p.1
Main Authors: Takamura, Yota, Nitta, Honami, Kawahara, Kazuma, Kaneko, Tadayuki, Ishido, Ryosuke, Miyazaki, Tatsuya, Hosoda, Naoki, Fujisaki, Keisuke, Nakagawa, Shigeki
Format: Article
Language:English
Subjects:
Columnar structure
Electronics
Inductors
Magnetic anisotropy
Magnetic films
Magnetic properties
Magnetism
Multilayers
Silicon dioxide
Sputtering
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Summary:A comprehensive study on fabrication of CoFeB–SiO2 films with large in-plane magnetic anisotropy for the use in high-frequency inductors in power electronics circuits was conducted. The magnetic films were deposited using facing target sputtering (FTS), which can introduce large uniaxial magnetic anisotropy in the plane. A multilayer structure consisting of CoFeB–SiO2 and SiO2 layers suppressed columnar growth and thus reduced undesired perpendicular magnetic anisotropy (PMA). As a result, a [Formula Omitted]-thick magnetic layer was achieved with excellent soft-magnetic properties and no stripe domain structure. The effectiveness of these magnetic films was demonstrated by fabricating and characterizing planar-type spiral coils. This development of micromagnetic inductors using the magnetic layer shows great potential for use in high-frequency power electronics applications.
ISSN:0018-9464
1941-0069
DOI:10.1109/TMAG.2023.3291879