Sputter‐Deposited α‐MoO3 Interlayers for van der Waals Epitaxy and Film Transfer

Integration of functional thin films onto flexible substrates is driven by the need to improve the performance and durability of flexible electronic devices. A van der Waals epitaxy technology that accomplishes the transfer of oxide or metal thin films via exfoliation or dissolution of sacrificial α...

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Bibliographic Details
Published in:Advanced functional materials 2024-01, Vol.34 (3)
Main Authors: Han, Sangho, Lee, Sangho, Ko, Dohyun, Zhang, Xinyuan, Kim, Jeehwan, Ross, Caroline A, Kim, Dong Hun
Format: Article
Language:English
Subjects:
Bonding strength
Cobalt ferrites
Dissolution
Epitaxial growth
Exfoliation
Gold
Interlayers
Magnetic anisotropy
Molybdenum trioxide
Substrates
Thin films
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Summary:Integration of functional thin films onto flexible substrates is driven by the need to improve the performance and durability of flexible electronic devices. A van der Waals epitaxy technology that accomplishes the transfer of oxide or metal thin films via exfoliation or dissolution of sacrificial α‐MoO3 layers produced by sputtering is presented. The α‐MoO3 thin films, consisting of weakly bonded 2D layers, grow epitaxially on SrTiO3 (001) substrates, exhibiting mosaic domains rotated by 90°. Metallic Au films grown on the α‐MoO3 are transferred by mechanical exfoliation or by dissolving the α‐MoO3 in water at 45 °C. Spinel‐structured CoFe2O4 thin films grown on α‐MoO3 layers are easily transferred to flexible substrates via mechanical exfoliation, and the magnetic anisotropy of the transferred CoFe2O4 films is modulated by bending.
ISSN:1616-301X
1616-3028
DOI:10.1002/adfm.202306909