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Fabrication of polyurushiol/Ag composite porous films using an in situ photoreduction method

In this work, polyurushiol (PUS) was synthesized through a Friedel–Crafts reaction using brönsted acid as a catalyst. The product was then utilized in the fabrication of honeycomb porous films by breath figures (BFs). The PUS porous films were subsequently exposed to a high pressure mercury lamp for...

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Bibliographic Details
Published in:Polymer bulletin (Berlin, Germany) Germany), 2016-06, Vol.73 (6), p.1639-1647
Main Authors: Wang, Donghui, Zhang, Meng, Luo, Zhen, Bai, Weibin, Xu, Yanlian, Lin, Jinhuo
Format: Article
Language:English
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Summary:In this work, polyurushiol (PUS) was synthesized through a Friedel–Crafts reaction using brönsted acid as a catalyst. The product was then utilized in the fabrication of honeycomb porous films by breath figures (BFs). The PUS porous films were subsequently exposed to a high pressure mercury lamp for several seconds (5–30 s). An AgNO 3 solution was then dripped onto the surface of films to form PUS/Ag composite porous films through the in situ photoreduction method, avoiding the use of harmful reducing agents. Key preparation factors, including solvent type, UV irradiation time and AgNO 3 concentration, were systematically investigated. The composite films were characterized using scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS) and X-ray diffraction (XRD). Ag particles (approximate size of 50 nm) were formed on the surface of PUS porous films when water was used as a solvent. In addition, increased AgNO 3 concentration or UV irradiation time facilitated a change in the conductivity state of PUS/Ag porous films from insulator to semiconductor. The as-prepared PUS/Ag composite porous films provided excellent electronic properties and thus provided significant potential for future application in various fields. Graphical abstract
ISSN:0170-0839
1436-2449
DOI:10.1007/s00289-015-1568-0