Investigation of vacuum measurement by nano‐gap device

Advances in microfabrication technology have enabled electron beam lithography (EB lithography) systems to produce microfabrication on the order of 10 of nanometers. Using this technology, we have fabricated nanogap electrodes that can generate large electric fields at low voltages. The gap between...

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Bibliographic Details
Published in:Electronics and communications in Japan 2024-03, Vol.107 (1), p.n/a
Main Authors: Komiya, Kazuki, Nagata, Koki, Yamaoka, Hidehiko, Date, Shuichi, Miyashita, Yuito, Yan, Min
Format: Article
Language:English
Subjects:
cold cathode field emission
Electric fields
Electrodes
Electron beam lithography
nanogap
vacuum
Vacuum gages
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Summary:Advances in microfabrication technology have enabled electron beam lithography (EB lithography) systems to produce microfabrication on the order of 10 of nanometers. Using this technology, we have fabricated nanogap electrodes that can generate large electric fields at low voltages. The gap between the tips of the fabricated electrodes is 100 nm, and the curvature of each tip is 50 nm. The device was confirmed to work as an electronic vacuum gauge, the device successfully measured vacuum from 10−3 to 1 Pa at the electrode voltage of 3 V.
ISSN:1942-9533
1942-9541
DOI:10.1002/ecj.12440