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Effect of Oxygen Flow Rate, Post-annealing Temperature, and Different Electrolyte Concentrations on WO3 Thin Films Deposited by DC Magnetron Sputtering For Electrochromic Applications

In this work, tungsten oxide (WO 3 ) films were deposited at room temperature and annealed for 2 h at 400°C. The electrochromic and electrochemical properties were studied for two different electrolytes. The films were deposited at different oxygen flow rates of 2, 4, and 6 standard cubic centimeter...

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Bibliographic Details
Published in:Journal of electronic materials 2024-05, Vol.53 (5), p.2351-2366
Main Authors: Kumar, K. Naveen, Reddy, G. V. Ashok, Sattar, Sheik Abdul, Jafri, R. Imran, Premkumar, R., Muthukrishnan, M., Ahamed, A. Asrar, Meera, M. R., Prakash, Nunna Guru, Tighezza, Ammar M., Ko, Tae Jo
Format: Article
Language:English
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Summary:In this work, tungsten oxide (WO 3 ) films were deposited at room temperature and annealed for 2 h at 400°C. The electrochromic and electrochemical properties were studied for two different electrolytes. The films were deposited at different oxygen flow rates of 2, 4, and 6 standard cubic centimeters per minute (SCCM). X-ray diffraction analysis revealed structural characterization of amorphous and crystalline phases. UV-visible spectroscopy optical transmittance revealed 91% transmittance, and energy-dispersive x-ray spectroscopy (EDS) analysis revealed the absence of impurities and the presence of W and O. An electrochemical analyzer was used to characterize the deposited and annealed WO 3 films immersed in the two different electrolyte solutions (H 2 SO 4 and LiClO 4 with oxygen flow rates ranging from 2 SCCM to 6 SCCM). It was found that the H 2 SO 4 electrolyte of an annealed WO 3 thin film at 2 SCCM demonstrated high coloring efficiency of 50.18 cm 2 /C, and the LiClO 4 electrolyte of an annealed WO 3 thin film at 4 SCCM demonstrated high coloring efficiency of 20.06 cm 2 /C.
ISSN:0361-5235
1543-186X
DOI:10.1007/s11664-024-11000-4