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Effect of Oxygen Flow Rate, Post-annealing Temperature, and Different Electrolyte Concentrations on WO3 Thin Films Deposited by DC Magnetron Sputtering For Electrochromic Applications
In this work, tungsten oxide (WO 3 ) films were deposited at room temperature and annealed for 2 h at 400°C. The electrochromic and electrochemical properties were studied for two different electrolytes. The films were deposited at different oxygen flow rates of 2, 4, and 6 standard cubic centimeter...
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Published in: | Journal of electronic materials 2024-05, Vol.53 (5), p.2351-2366 |
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Main Authors: | , , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | In this work, tungsten oxide (WO
3
) films were deposited at room temperature and annealed for 2 h at 400°C. The electrochromic and electrochemical properties were studied for two different electrolytes. The films were deposited at different oxygen flow rates of 2, 4, and 6 standard cubic centimeters per minute (SCCM). X-ray diffraction analysis revealed structural characterization of amorphous and crystalline phases. UV-visible spectroscopy optical transmittance revealed 91% transmittance, and energy-dispersive x-ray spectroscopy (EDS) analysis revealed the absence of impurities and the presence of W and O. An electrochemical analyzer was used to characterize the deposited and annealed WO
3
films immersed in the two different electrolyte solutions (H
2
SO
4
and LiClO
4
with oxygen flow rates ranging from 2 SCCM to 6 SCCM). It was found that the H
2
SO
4
electrolyte of an annealed WO
3
thin film at 2 SCCM demonstrated high coloring efficiency of 50.18 cm
2
/C, and the LiClO
4
electrolyte of an annealed WO
3
thin film at 4 SCCM demonstrated high coloring efficiency of 20.06 cm
2
/C. |
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ISSN: | 0361-5235 1543-186X |
DOI: | 10.1007/s11664-024-11000-4 |