Effect of Low-Temperature Plasma on Polyketone Films: Changes in the Chemical Structure and Surface Morphology

X-ray photoelectron spectroscopy was used to study the change in the chemical composition of the surface of polyketone films as a result of exposure to a low-pressure direct-current (DC) discharge. The films were placed at the anode and cathode; filtered atmospheric air was used as a working gas. It...

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Bibliographic Details
Published in:Inorganic materials : applied research 2023-12, Vol.14 (5-6), p.1377-1382
Main Authors: Piskarev, M. S., Zinoviev, A. V., Gilman, A. B., Skryleva, E. A., Senatulin, B. R., Gatin, A. K., Kuznetsov, A. A.
Format: Article
Language:English
Subjects:
Atomic properties
Chemical composition
Chemistry
Chemistry and Materials Science
Industrial Chemistry/Chemical Engineering
Inorganic Chemistry
Low pressure
Low temperature
Materials Science
New Technologies for Obtaining and Processing Materials
Photoelectrons
Polyketones
Surface roughness
X ray photoelectron spectroscopy
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Summary:X-ray photoelectron spectroscopy was used to study the change in the chemical composition of the surface of polyketone films as a result of exposure to a low-pressure direct-current (DC) discharge. The films were placed at the anode and cathode; filtered atmospheric air was used as a working gas. It was shown that a significant number of oxygen-containing groups is formed on the polymer surface. An atomic force microscopy study detected that plasma treatment leads to a considerable increase in the surface roughness of the films. Such changes improve the contact and adhesion properties of polyketone films.
ISSN:2075-1133
2075-115X
DOI:10.1134/S2075113323050362