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Effective medium metasurfaces using nanoimprinting of the refractive index: design, performance, and predictive tolerance analysis
Production of flat optics incorporating subwavelength features, particularly at visible frequencies, remains a significant challenge. Here, we establish a framework for the design of effective medium metasurfaces (EMM), relying on nanoimprinting of mesoporous silicon to realize a patterned refractiv...
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Published in: | Optical materials express 2024-04, Vol.14 (4), p.847 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | Production of flat optics incorporating subwavelength features, particularly at visible frequencies, remains a significant challenge. Here, we establish a framework for the design of effective medium metasurfaces (EMM), relying on nanoimprinting of mesoporous silicon to realize a patterned refractive index n (x,y) corresponding to an arbitrary transmitted phase profile ϕ (x,y). The method is used to design the stamp profile required to produce a Fresnel lens and the theoretical performance of the metalens is examined using the finite-difference time-domain method. Additionally, we demonstrate neural network aided Monte Carlo analysis as a method to model the effects of metasurface fabrications errors on EMM performance and process yield. |
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ISSN: | 2159-3930 2159-3930 |
DOI: | 10.1364/OME.515617 |