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The fabrication of spin transfer torque-based magnetoresistive random access memory cell with ultra-low switching power
We conducted research on the integration technology of a spin transfer torque-based magnetoresistive random access memory (STT-MRAM) cell (one transistor, one magnetic tunnel junction – 1T-1MTJ) on an 8-inch process platform. By combining a 0.5 μ m CMOS front end of line process and STT-MTJ back en...
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Published in: | Japanese Journal of Applied Physics 2024-05, Vol.63 (5), p.5 |
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container_title | Japanese Journal of Applied Physics |
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creator | Yang, Chengchang Zou, Sinan Chen, Xu Gao, Jianfeng Liu, Weibing Yang, Meiyin Xu, Jing Kang, Jin Bu, Weihai Zheng, Kai Cui, Yan Luo, Jun |
description | We conducted research on the integration technology of a spin transfer torque-based magnetoresistive random access memory (STT-MRAM) cell (one transistor, one magnetic tunnel junction – 1T-1MTJ) on an 8-inch process platform. By combining a 0.5
μ
m CMOS front end of line process and STT-MTJ back end of line process, a 1T-1MTJ device with an MTJ of approximately 80 nm is realized. The Resistance(R)-magnetic field(H) measurement reveals a coercive force of approximately 450 Oe for the MTJ. Nevertheless, the 1T-1MTJ device exhibits a critical switching current of 4.7
μ
A (from high to low resistance state) and 17.9
μ
A (from low to high resistance state), accompanied by corresponding critical switching voltages of 0.05 V and 0.16 V, respectively, which is extremely low in an STT-MRAM with dual CoFeB/MgO interface free layer. Our findings demonstrate the potential for application in ultra-low-power portable mobile devices and embedded systems. |
doi_str_mv | 10.35848/1347-4065/ad38c6 |
format | article |
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μ
m CMOS front end of line process and STT-MTJ back end of line process, a 1T-1MTJ device with an MTJ of approximately 80 nm is realized. The Resistance(R)-magnetic field(H) measurement reveals a coercive force of approximately 450 Oe for the MTJ. Nevertheless, the 1T-1MTJ device exhibits a critical switching current of 4.7
μ
A (from high to low resistance state) and 17.9
μ
A (from low to high resistance state), accompanied by corresponding critical switching voltages of 0.05 V and 0.16 V, respectively, which is extremely low in an STT-MRAM with dual CoFeB/MgO interface free layer. Our findings demonstrate the potential for application in ultra-low-power portable mobile devices and embedded systems.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.35848/1347-4065/ad38c6</identifier><identifier>CODEN: JJAPB6</identifier><language>eng</language><publisher>Tokyo: IOP Publishing</publisher><subject>back end of line ; Coercivity ; High resistance ; integrated process ; low power consumption ; Low resistance ; Magnetoresistivity ; Portable equipment ; Power management ; Random access memory ; spin transfer torque-based magnetoresistive random access memory ; Switching ; Torque ; Tunnel junctions</subject><ispartof>Japanese Journal of Applied Physics, 2024-05, Vol.63 (5), p.5</ispartof><rights>2024 The Japan Society of Applied Physics</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c296t-83b9675c81d9b38781526f28fcc46d192996d59e06fa6846c6f88460ed49d8d33</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.35848/1347-4065/ad38c6/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,780,784,27924,27925,38868,53840</link.rule.ids></links><search><creatorcontrib>Yang, Chengchang</creatorcontrib><creatorcontrib>Zou, Sinan</creatorcontrib><creatorcontrib>Chen, Xu</creatorcontrib><creatorcontrib>Gao, Jianfeng</creatorcontrib><creatorcontrib>Liu, Weibing</creatorcontrib><creatorcontrib>Yang, Meiyin</creatorcontrib><creatorcontrib>Xu, Jing</creatorcontrib><creatorcontrib>Kang, Jin</creatorcontrib><creatorcontrib>Bu, Weihai</creatorcontrib><creatorcontrib>Zheng, Kai</creatorcontrib><creatorcontrib>Cui, Yan</creatorcontrib><creatorcontrib>Luo, Jun</creatorcontrib><title>The fabrication of spin transfer torque-based magnetoresistive random access memory cell with ultra-low switching power</title><title>Japanese Journal of Applied Physics</title><addtitle>Jpn. J. Appl. Phys</addtitle><description>We conducted research on the integration technology of a spin transfer torque-based magnetoresistive random access memory (STT-MRAM) cell (one transistor, one magnetic tunnel junction – 1T-1MTJ) on an 8-inch process platform. By combining a 0.5
μ
m CMOS front end of line process and STT-MTJ back end of line process, a 1T-1MTJ device with an MTJ of approximately 80 nm is realized. The Resistance(R)-magnetic field(H) measurement reveals a coercive force of approximately 450 Oe for the MTJ. Nevertheless, the 1T-1MTJ device exhibits a critical switching current of 4.7
μ
A (from high to low resistance state) and 17.9
μ
A (from low to high resistance state), accompanied by corresponding critical switching voltages of 0.05 V and 0.16 V, respectively, which is extremely low in an STT-MRAM with dual CoFeB/MgO interface free layer. Our findings demonstrate the potential for application in ultra-low-power portable mobile devices and embedded systems.</description><subject>back end of line</subject><subject>Coercivity</subject><subject>High resistance</subject><subject>integrated process</subject><subject>low power consumption</subject><subject>Low resistance</subject><subject>Magnetoresistivity</subject><subject>Portable equipment</subject><subject>Power management</subject><subject>Random access memory</subject><subject>spin transfer torque-based magnetoresistive random access memory</subject><subject>Switching</subject><subject>Torque</subject><subject>Tunnel junctions</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><recordid>eNp1kEtLAzEUhYMoWB8_wF3AjZuxyeTRZCnFFxQU1HVI82hTZiZjMrX035ta0Y2uLufynXO5B4ALjK4JE1SMMaGTiiLOxtoSYfgBGP2sDsEIoRpXVNb1MTjJeVUkZxSPwOZ16aDX8xSMHkLsYPQw96GDQ9Jd9i7BIab3tavmOjsLW73oXNm4HPIQPhwslI0t1Ma4nGHr2pi20LimgZswLOG6KTlVEzcwF22WoVvAPm5cOgNHXjfZnX_PU_B2d_s6fahmT_eP05tZZWrJh0qQueQTZgS2ck7ERGBWc18LbwzlFstaSm6ZdIh7zQXlhntRBnKWSissIafgcp_bp1jeyINaxXXqyklFEKNSMMFRofCeMinmnJxXfQqtTluFkfrqV-3KVLsy1b7f4rnae0Lsf0NXK90rThRTiL08F3dvfUGrP9D_oz8B8ziL3Q</recordid><startdate>20240501</startdate><enddate>20240501</enddate><creator>Yang, Chengchang</creator><creator>Zou, Sinan</creator><creator>Chen, Xu</creator><creator>Gao, Jianfeng</creator><creator>Liu, Weibing</creator><creator>Yang, Meiyin</creator><creator>Xu, Jing</creator><creator>Kang, Jin</creator><creator>Bu, Weihai</creator><creator>Zheng, Kai</creator><creator>Cui, Yan</creator><creator>Luo, Jun</creator><general>IOP Publishing</general><general>Japanese Journal of Applied Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20240501</creationdate><title>The fabrication of spin transfer torque-based magnetoresistive random access memory cell with ultra-low switching power</title><author>Yang, Chengchang ; Zou, Sinan ; Chen, Xu ; Gao, Jianfeng ; Liu, Weibing ; Yang, Meiyin ; Xu, Jing ; Kang, Jin ; Bu, Weihai ; Zheng, Kai ; Cui, Yan ; Luo, Jun</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c296t-83b9675c81d9b38781526f28fcc46d192996d59e06fa6846c6f88460ed49d8d33</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><topic>back end of line</topic><topic>Coercivity</topic><topic>High resistance</topic><topic>integrated process</topic><topic>low power consumption</topic><topic>Low resistance</topic><topic>Magnetoresistivity</topic><topic>Portable equipment</topic><topic>Power management</topic><topic>Random access memory</topic><topic>spin transfer torque-based magnetoresistive random access memory</topic><topic>Switching</topic><topic>Torque</topic><topic>Tunnel junctions</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yang, Chengchang</creatorcontrib><creatorcontrib>Zou, Sinan</creatorcontrib><creatorcontrib>Chen, Xu</creatorcontrib><creatorcontrib>Gao, Jianfeng</creatorcontrib><creatorcontrib>Liu, Weibing</creatorcontrib><creatorcontrib>Yang, Meiyin</creatorcontrib><creatorcontrib>Xu, Jing</creatorcontrib><creatorcontrib>Kang, Jin</creatorcontrib><creatorcontrib>Bu, Weihai</creatorcontrib><creatorcontrib>Zheng, Kai</creatorcontrib><creatorcontrib>Cui, Yan</creatorcontrib><creatorcontrib>Luo, Jun</creatorcontrib><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yang, Chengchang</au><au>Zou, Sinan</au><au>Chen, Xu</au><au>Gao, Jianfeng</au><au>Liu, Weibing</au><au>Yang, Meiyin</au><au>Xu, Jing</au><au>Kang, Jin</au><au>Bu, Weihai</au><au>Zheng, Kai</au><au>Cui, Yan</au><au>Luo, Jun</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The fabrication of spin transfer torque-based magnetoresistive random access memory cell with ultra-low switching power</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><addtitle>Jpn. J. Appl. Phys</addtitle><date>2024-05-01</date><risdate>2024</risdate><volume>63</volume><issue>5</issue><spage>5</spage><pages>5-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPB6</coden><abstract>We conducted research on the integration technology of a spin transfer torque-based magnetoresistive random access memory (STT-MRAM) cell (one transistor, one magnetic tunnel junction – 1T-1MTJ) on an 8-inch process platform. By combining a 0.5
μ
m CMOS front end of line process and STT-MTJ back end of line process, a 1T-1MTJ device with an MTJ of approximately 80 nm is realized. The Resistance(R)-magnetic field(H) measurement reveals a coercive force of approximately 450 Oe for the MTJ. Nevertheless, the 1T-1MTJ device exhibits a critical switching current of 4.7
μ
A (from high to low resistance state) and 17.9
μ
A (from low to high resistance state), accompanied by corresponding critical switching voltages of 0.05 V and 0.16 V, respectively, which is extremely low in an STT-MRAM with dual CoFeB/MgO interface free layer. Our findings demonstrate the potential for application in ultra-low-power portable mobile devices and embedded systems.</abstract><cop>Tokyo</cop><pub>IOP Publishing</pub><doi>10.35848/1347-4065/ad38c6</doi><tpages>6</tpages></addata></record> |
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subjects | back end of line Coercivity High resistance integrated process low power consumption Low resistance Magnetoresistivity Portable equipment Power management Random access memory spin transfer torque-based magnetoresistive random access memory Switching Torque Tunnel junctions |
title | The fabrication of spin transfer torque-based magnetoresistive random access memory cell with ultra-low switching power |
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