Deposition of a‐C:H:SiOx Coatings Using Low‐Frequency Inductively Coupled Plasma

• Published in: Physica status solidi. A, Applications and materials science Applications and materials science, 2024-06, Vol.221 (11), p.n/a
• Main Authors: Grenadyorov, Alexander S., Semenov, Vyacheslav A., Oskirko, Vladimir O., Oskomov, Konstantin V., Solovyev, Andrey A.
• Format: Article
• Language: English
• Subjects: Arc discharges; Chemical vapor deposition; Coatings; Electric arcs; hardness; Hot cathodes; Inductively coupled plasma; Inductors; Ion bombardment; Ion current density; Ion currents; Mechanical properties; plasma‐enhanced chemical vapor deposition; Plastic deformation; Plasticity index; Raman spectroscopy; roughness; Substrates; Surface roughness
• ISSN: 1862-6300; 1862-6319
• DOI: 10.1002/pssa.202300890

This article investigates the plasma‐enhanced chemical vapor deposition of a‐C:H:SiOx coatings in a non‐self‐sustaining arc discharge plasma with a hot cathode in combination with a low‐frequency (200 kHz) inductively coupled plasma. It is shown that increasing the inductor power from 0 to 600 W leads to a twofold increase in the ion current density on the substrate. An increase in ion bombardment intensity results in a 1.3‐fold reduction in the coating's growth rate due to the resputtering phenomenon, a 1.5‐fold reduction in surface roughness, and an improvement in the mechanical properties of the coatings. The hardness of the coating is increased by 9–11%, the plasticity index by 10–17%, and the resistance to plastic deformation by 32–49%. a‐C:H:SiOx coatings are synthesized by the plasma‐enhanced chemical vapor deposition in a non‐self‐sustaining arc discharge plasma with a hot cathode in combination with a low‐frequency (200 kHz) inductively coupled plasma. Surface roughness is reduced and mechanical properties are improved by increasing the ion bombardment intensity of the coating.