Impacts of Backside Insulation on the Dynamic On-Resistance of Lateral p-GaN HEMTs-on-Si

We examined the effect of backside insulation on the dynamic on-resistance of lateral p-GaN HEMTs. To gain a comprehensive understanding of the dynamic onresistance difference between substrate grounded and substrate floating p-GaN HEMTs, we conducted in-circuit double pulse testing and long-term di...

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Bibliographic Details
Published in:arXiv.org 2024-06
Main Authors: Yu-Xuan, Wang, Mao-Chou, Tai, Ting-Chang, Chang, Wei-Chen, Huang, Wan, Zeyu, Li, Simon, Sze, Simon, Xia, Guangrui
Format: Article
Language:English
Subjects:
Breakdown
Buffers
Direct current
Electric potential
Gallium nitrides
High electron mobility transistors
Insulation
Potential barriers
Reliability
Substrates
Tradeoffs
Voltage
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Summary:We examined the effect of backside insulation on the dynamic on-resistance of lateral p-GaN HEMTs. To gain a comprehensive understanding of the dynamic onresistance difference between substrate grounded and substrate floating p-GaN HEMTs, we conducted in-circuit double pulse testing and long-term direct current (DC) bias stress. We have realized that while backside insulation can enhance the breakdown voltage of lateral p-GaN HEMTs, it also comes with a tradeoff in device reliability. Results through Sentaurus TCAD simulation suggest that the use of backside insulation in devices gradually disperses potential to the buffer barrier. As a result, the potential barrier at the buffer edge of the 2DEG channel decreases significantly, leading to considerable electron trappings at buffer traps. This breakdown voltage and reliability tradeoff also applies to HEMT technologies using insulating substrates.
ISSN:2331-8422