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P‐11.5: Realization of High PPI Transparent TFT Backplane and Its Application in Micro‐LED Display
This paper mainly introduces the implementation method of a high PPI transparent Micro‐LED display. By optimizing the pixel layout, proposing an innovative substrate array structure and process method, and introducing a high brightness uniformity driving scheme, a 8.07” high PPI transparent Micro‐LE...
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Published in: | SID International Symposium Digest of technical papers 2024-04, Vol.55 (S1), p.1301-1304 |
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container_title | SID International Symposium Digest of technical papers |
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creator | Xie, Mengmeng Liu, Xiaoli Wu, Yingying Hu, Yuqi Chen, Peixuan Wang, Meng Jiang, Wenxin Wu, Tianyi |
description | This paper mainly introduces the implementation method of a high PPI transparent Micro‐LED display. By optimizing the pixel layout, proposing an innovative substrate array structure and process method, and introducing a high brightness uniformity driving scheme, a 8.07” high PPI transparent Micro‐LED display is produced while maintaining high PPI, while also considering high transmittance and high brightness, which proposes a new technology carrier for Micro‐LED transparent display applications. |
doi_str_mv | 10.1002/sdtp.17347 |
format | article |
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source | Wiley-Blackwell Read & Publish Collection |
subjects | Backplanes Brightness Light emitting diodes PPI Reflectivity Substrates Transmittance Uniformity |
title | P‐11.5: Realization of High PPI Transparent TFT Backplane and Its Application in Micro‐LED Display |
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