69‐4: Distinguished Paper: High‐luminance and Highly Reliable Tandem OLED Display Including New Intermediate Connector Designed for Photolithography Applications

We achieved a high‐luminance and highly reliable tandem organic light‐emitting diode (OLED) designed for photolithography applications by developing a new intermediate connector with resistance to water and atmospheric elements. We succeeded in fabricating a side‐by‐side (SBS) tandem OLED display by...

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Published in:SID International Symposium Digest of technical papers 2024-06, Vol.55 (1), p.957-960
Main Authors: Fukuzaki, Shinya, Sasaki, Toshiki, Nowatari, Hiromi, Oe, Yuko, Yamada, Yui, Ohsawa, Nobuharu, Yamazaki, Shunpei
Format: Article
Language:English
Subjects:
High luminance
High‐aperture ratio patterned organic semiconductor (HarPOS)
High‐pixel‐density
Intermediate connector
Light emitting diodes
Long lifetime
Luminance
Metal maskless lithography (MML)
Photolithography
Side‐by‐side
Tandem OLED
Water resistance
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container_title SID International Symposium Digest of technical papers
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creator Fukuzaki, Shinya
Sasaki, Toshiki
Nowatari, Hiromi
Oe, Yuko
Yamada, Yui
Ohsawa, Nobuharu
Yamazaki, Shunpei
description We achieved a high‐luminance and highly reliable tandem organic light‐emitting diode (OLED) designed for photolithography applications by developing a new intermediate connector with resistance to water and atmospheric elements. We succeeded in fabricating a side‐by‐side (SBS) tandem OLED display by our SBS pixel‐patterning method involving organic layer etching via photolithography.
doi_str_mv 10.1002/sdtp.17694
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source Wiley-Blackwell Read & Publish Collection
subjects High luminance
High‐aperture ratio patterned organic semiconductor (HarPOS)
High‐pixel‐density
Intermediate connector
Light emitting diodes
Long lifetime
Luminance
Metal maskless lithography (MML)
Photolithography
Side‐by‐side
Tandem OLED
Water resistance
title 69‐4: Distinguished Paper: High‐luminance and Highly Reliable Tandem OLED Display Including New Intermediate Connector Designed for Photolithography Applications
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