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Synthesis of Botryosin-type Resist Material Containing Acetal Groups in the Main Chain and Its Sensitivity

Polyaddition reaction of 4-tert-butylcalix[8]arene derivative (BCA[8]-VE) with pendant vinyl ether groups and 4,4-(propane-2,2-diyl)diphenol (PDP) was examined, to afford the grape-shaped polyacetal (Botryosin) poly(BCA[8]-VE-co-PDP). The synthesized poly(BCA[8]-VE-co-PDP) showed good physical prope...

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2024/06/25, Vol.37(3), pp.293-298
Main Authors: Akabane, Riku, Okamoto, Kazumasa, Kozawa, Takahiro, Kudo, Hiroto
Format: Article
Language:English
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Summary:Polyaddition reaction of 4-tert-butylcalix[8]arene derivative (BCA[8]-VE) with pendant vinyl ether groups and 4,4-(propane-2,2-diyl)diphenol (PDP) was examined, to afford the grape-shaped polyacetal (Botryosin) poly(BCA[8]-VE-co-PDP). The synthesized poly(BCA[8]-VE-co-PDP) showed good physical properties such as high thermal stability, solubility, and film-forming ability to relevant to resist material. Furthermore, its resist sensitivity was examined using electron beam (EB) exposure tool and showed a good sensitivity of E0 = 50 μC/cm2. Then its sensitivity was also examined using extreme ultraviolet (EUV) light exposure tool and showed a good sensitivity of E0 = 4.0 mJ/cm2 with high contrast.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.37.293