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Angstrom-scale ion-beam engineering of ultrathin buried oxides for quantum and neuro-inspired computing

Multilayer nanoscale systems incorporating buried ultrathin tunnel oxides, 2D materials, and solid electrolytes are crucial for next-generation logics, memory, quantum and neuro-inspired computing. Still, an ultrathin layer control at angstrom scale is challenging for cutting-edge applications. Here...

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Bibliographic Details
Published in:arXiv.org 2024-08
Main Authors: Smirnov, N, Krivko, E, Moskaleva, D, Moskalev, D, Solovieva, A, Echeistov, V, Zikiy, E, Korshakov, N, Ivanov, A, Malevannaya, E, Matanin, A, Polozov, V, Teleganov, M, Zhitkov, N, Romashkin, R, Korobenko, I, Yanilkin, A, Lebedev, A, Ryzhikov, I, Andriyash, A, Rodionov, I
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Language:English
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Summary:Multilayer nanoscale systems incorporating buried ultrathin tunnel oxides, 2D materials, and solid electrolytes are crucial for next-generation logics, memory, quantum and neuro-inspired computing. Still, an ultrathin layer control at angstrom scale is challenging for cutting-edge applications. Here we introduce a scalable approach utilizing focused ion-beam annealing for buried ultrathin oxides engineering with angstrom-scale thickness control. Our molecular dynamics simulations of Ne+ irradiation on Al/a-AlOx/Al structure confirms the pivotal role of ion generated crystal defects. We experimentally demonstrate its performance on Josephson junction tunning in the resistance range of 2 to 37% with a standard deviation of 0.86% across 25x25 mm chip. Moreover, we showcase +-17 MHz frequency control (+-0.172 A tunnel barrier thickness) for superconducting transmon qubits with coherence times up to 500 us, which is promising for useful fault-tolerant quantum computing. This work ensures ultrathin multilayer nanosystems engineering at the ultimate scale by depth-controlled crystal defects generation.
ISSN:2331-8422