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Retraction Note: Optimization of plasma etch rate of deposited thin films by adaptive neuro fuzzy inference system
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Published in: | International journal of advanced manufacturing technology 2024-10, Vol.134 (7-8), p.3989-3989 |
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Main Author: | |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
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ISSN: | 0268-3768 1433-3015 |
DOI: | 10.1007/s00170-024-14355-4 |