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Surface wettability and photocatalytic activities of ZrOxNy monolayer, ZrOxNy/Au bilayer and ZrOxNy/Au/TeO2 trilayer for self-cleaning and antifogging coatings applications
ZrO x N y monolayer, ZrO x N y /Au bilayer, ZrO x N y /Au/TeO 2 trilayer films were investigated for their hydrophilic properties and photocatalytic activities. ZrO x N y and Au layers were prepared by dc reactive magnetron sputtering whereas TeO 2 layer was prepared by vapor transport technique. X-...
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Published in: | Journal of materials science. Materials in electronics 2024-09, Vol.35 (26), p.1737, Article 1737 |
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container_title | Journal of materials science. Materials in electronics |
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creator | Hassaballa, S. Aljabri, A. Mohamed, S. H. EL-Kassem, M. Abo Hakeem, A. M. Abdel Awad, M. A. |
description | ZrO
x
N
y
monolayer, ZrO
x
N
y
/Au bilayer, ZrO
x
N
y
/Au/TeO
2
trilayer films were investigated for their hydrophilic properties and photocatalytic activities. ZrO
x
N
y
and Au layers were prepared by dc reactive magnetron sputtering whereas TeO
2
layer was prepared by vapor transport technique. X-ray diffraction revealed the formation of monoclinic ZrO
2
phase for ZrO
x
N
y
films with low nitrogen content whereas mixed monoclinic and tetragonal ZrO
2
phases were formed for ZrO
x
N
y
films with higher nitrogen content. The chemical composition of ZrO
x
N
y
bottom layer affected the growth of the Au layer. The tetragonal TeO
2
, in ZrO
x
N
y
/Au/TeO
2
trilayer, blocked most of ZrO
2
and Au crystallographic peaks. The ZrO
x
N
y
/Au films are composed of tiny nanoparticles in the range 27–33 nm and the ZrO
x
N
y
/Au/TeO
2
films have branched-nanowires morphology. ZrO
x
N
y
monolayer films are hydrophilic and the hydrophilicity decreases then increases with increasing the nitrogen content in the film. Adding an Au layer, then TeO
2
layer over ZrO
x
N
y
resulted in a pronounced decrease in water contact angle. After UV-illumination the contact angle of the films became almost zero and the surfaces transformed to super-hydrophilic. Nitrogen doping enhances the degradation rate of ZrO
x
N
y
monolayer film. The highest degradation rate was observed for ZrO
1.9
N
0.3
/Au/TeO
2
trilayer film. The prepared ZrO
x
N
y
/Au/TeO
2
trilayer films are good candidates for self-cleaning and antifogging applications. |
doi_str_mv | 10.1007/s10854-024-13489-1 |
format | article |
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x
N
y
monolayer, ZrO
x
N
y
/Au bilayer, ZrO
x
N
y
/Au/TeO
2
trilayer films were investigated for their hydrophilic properties and photocatalytic activities. ZrO
x
N
y
and Au layers were prepared by dc reactive magnetron sputtering whereas TeO
2
layer was prepared by vapor transport technique. X-ray diffraction revealed the formation of monoclinic ZrO
2
phase for ZrO
x
N
y
films with low nitrogen content whereas mixed monoclinic and tetragonal ZrO
2
phases were formed for ZrO
x
N
y
films with higher nitrogen content. The chemical composition of ZrO
x
N
y
bottom layer affected the growth of the Au layer. The tetragonal TeO
2
, in ZrO
x
N
y
/Au/TeO
2
trilayer, blocked most of ZrO
2
and Au crystallographic peaks. The ZrO
x
N
y
/Au films are composed of tiny nanoparticles in the range 27–33 nm and the ZrO
x
N
y
/Au/TeO
2
films have branched-nanowires morphology. ZrO
x
N
y
monolayer films are hydrophilic and the hydrophilicity decreases then increases with increasing the nitrogen content in the film. Adding an Au layer, then TeO
2
layer over ZrO
x
N
y
resulted in a pronounced decrease in water contact angle. After UV-illumination the contact angle of the films became almost zero and the surfaces transformed to super-hydrophilic. Nitrogen doping enhances the degradation rate of ZrO
x
N
y
monolayer film. The highest degradation rate was observed for ZrO
1.9
N
0.3
/Au/TeO
2
trilayer film. The prepared ZrO
x
N
y
/Au/TeO
2
trilayer films are good candidates for self-cleaning and antifogging applications.</description><identifier>ISSN: 0957-4522</identifier><identifier>EISSN: 1573-482X</identifier><identifier>DOI: 10.1007/s10854-024-13489-1</identifier><language>eng</language><publisher>New York: Springer US</publisher><subject>Bilayers ; Characterization and Evaluation of Materials ; Chemical composition ; Chemistry and Materials Science ; Cleaning ; Contact angle ; Crystallography ; Degradation ; Gold ; Hydrophilicity ; Magnetic properties ; Magnetron sputtering ; Materials Science ; Monolayers ; Nanowires ; Nitrogen ; Optical and Electronic Materials ; Photocatalysis ; Tellurium dioxide ; Wettability ; Zirconium dioxide</subject><ispartof>Journal of materials science. Materials in electronics, 2024-09, Vol.35 (26), p.1737, Article 1737</ispartof><rights>The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2024. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c200t-76783718ad270d220a9efe3446b4bc4c3b07d46b647c76d45e7378e0e015672e3</cites><orcidid>0000-0002-2612-7697</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Hassaballa, S.</creatorcontrib><creatorcontrib>Aljabri, A.</creatorcontrib><creatorcontrib>Mohamed, S. H.</creatorcontrib><creatorcontrib>EL-Kassem, M. Abo</creatorcontrib><creatorcontrib>Hakeem, A. M. Abdel</creatorcontrib><creatorcontrib>Awad, M. A.</creatorcontrib><title>Surface wettability and photocatalytic activities of ZrOxNy monolayer, ZrOxNy/Au bilayer and ZrOxNy/Au/TeO2 trilayer for self-cleaning and antifogging coatings applications</title><title>Journal of materials science. Materials in electronics</title><addtitle>J Mater Sci: Mater Electron</addtitle><description>ZrO
x
N
y
monolayer, ZrO
x
N
y
/Au bilayer, ZrO
x
N
y
/Au/TeO
2
trilayer films were investigated for their hydrophilic properties and photocatalytic activities. ZrO
x
N
y
and Au layers were prepared by dc reactive magnetron sputtering whereas TeO
2
layer was prepared by vapor transport technique. X-ray diffraction revealed the formation of monoclinic ZrO
2
phase for ZrO
x
N
y
films with low nitrogen content whereas mixed monoclinic and tetragonal ZrO
2
phases were formed for ZrO
x
N
y
films with higher nitrogen content. The chemical composition of ZrO
x
N
y
bottom layer affected the growth of the Au layer. The tetragonal TeO
2
, in ZrO
x
N
y
/Au/TeO
2
trilayer, blocked most of ZrO
2
and Au crystallographic peaks. The ZrO
x
N
y
/Au films are composed of tiny nanoparticles in the range 27–33 nm and the ZrO
x
N
y
/Au/TeO
2
films have branched-nanowires morphology. ZrO
x
N
y
monolayer films are hydrophilic and the hydrophilicity decreases then increases with increasing the nitrogen content in the film. Adding an Au layer, then TeO
2
layer over ZrO
x
N
y
resulted in a pronounced decrease in water contact angle. After UV-illumination the contact angle of the films became almost zero and the surfaces transformed to super-hydrophilic. Nitrogen doping enhances the degradation rate of ZrO
x
N
y
monolayer film. The highest degradation rate was observed for ZrO
1.9
N
0.3
/Au/TeO
2
trilayer film. The prepared ZrO
x
N
y
/Au/TeO
2
trilayer films are good candidates for self-cleaning and antifogging applications.</description><subject>Bilayers</subject><subject>Characterization and Evaluation of Materials</subject><subject>Chemical composition</subject><subject>Chemistry and Materials Science</subject><subject>Cleaning</subject><subject>Contact angle</subject><subject>Crystallography</subject><subject>Degradation</subject><subject>Gold</subject><subject>Hydrophilicity</subject><subject>Magnetic properties</subject><subject>Magnetron sputtering</subject><subject>Materials Science</subject><subject>Monolayers</subject><subject>Nanowires</subject><subject>Nitrogen</subject><subject>Optical and Electronic Materials</subject><subject>Photocatalysis</subject><subject>Tellurium dioxide</subject><subject>Wettability</subject><subject>Zirconium dioxide</subject><issn>0957-4522</issn><issn>1573-482X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><recordid>eNp9Uctu2zAQJIIGiOv0B3IikGtZLx8S5WMQtEkBoz7UAYJeBJpaOTQUUSHpJPqnfmTpB9pbLzvY2dnZBYaQKw5fOICeRQ5VoRgIxbhU1ZzxMzLhhZZMVeLxA5nAvNBMFUJckI8xbgGgVLKakN8_d6E1FukbpmTWrnNppKZv6PDkk7cmmW5MzlJjk3t1yWGkvqW_wvL9x0iffe87M2L4fGJmNzuaPfbUweQvO1vhUtAUTrPWBxqxa5nt0PSu3xzUpk-u9ZvNvrfepIyRmmHoXP7D-T5ekvPWdBE_nXBKHr59Xd3es8Xy7vvtzYJZAZCYLnUlNa9MIzQ0QoCZY4tSqXKt1lZZuQbd5KZU2uqyUQVqqSsEBF6UWqCckuuj7xD8yw5jqrd-F_p8spYcSsG14GVWiaPKBh9jwLYegns2Yaw51PtU6mMqdU6lPqSS65TI41LM4n6D4Z_1f7b-AAcUkt4</recordid><startdate>20240901</startdate><enddate>20240901</enddate><creator>Hassaballa, S.</creator><creator>Aljabri, A.</creator><creator>Mohamed, S. H.</creator><creator>EL-Kassem, M. Abo</creator><creator>Hakeem, A. M. Abdel</creator><creator>Awad, M. A.</creator><general>Springer US</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>F28</scope><scope>FR3</scope><scope>JG9</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0002-2612-7697</orcidid></search><sort><creationdate>20240901</creationdate><title>Surface wettability and photocatalytic activities of ZrOxNy monolayer, ZrOxNy/Au bilayer and ZrOxNy/Au/TeO2 trilayer for self-cleaning and antifogging coatings applications</title><author>Hassaballa, S. ; Aljabri, A. ; Mohamed, S. H. ; EL-Kassem, M. Abo ; Hakeem, A. M. Abdel ; Awad, M. A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c200t-76783718ad270d220a9efe3446b4bc4c3b07d46b647c76d45e7378e0e015672e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><topic>Bilayers</topic><topic>Characterization and Evaluation of Materials</topic><topic>Chemical composition</topic><topic>Chemistry and Materials Science</topic><topic>Cleaning</topic><topic>Contact angle</topic><topic>Crystallography</topic><topic>Degradation</topic><topic>Gold</topic><topic>Hydrophilicity</topic><topic>Magnetic properties</topic><topic>Magnetron sputtering</topic><topic>Materials Science</topic><topic>Monolayers</topic><topic>Nanowires</topic><topic>Nitrogen</topic><topic>Optical and Electronic Materials</topic><topic>Photocatalysis</topic><topic>Tellurium dioxide</topic><topic>Wettability</topic><topic>Zirconium dioxide</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Hassaballa, S.</creatorcontrib><creatorcontrib>Aljabri, A.</creatorcontrib><creatorcontrib>Mohamed, S. H.</creatorcontrib><creatorcontrib>EL-Kassem, M. Abo</creatorcontrib><creatorcontrib>Hakeem, A. M. Abdel</creatorcontrib><creatorcontrib>Awad, M. A.</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of materials science. Materials in electronics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Hassaballa, S.</au><au>Aljabri, A.</au><au>Mohamed, S. H.</au><au>EL-Kassem, M. Abo</au><au>Hakeem, A. M. Abdel</au><au>Awad, M. A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Surface wettability and photocatalytic activities of ZrOxNy monolayer, ZrOxNy/Au bilayer and ZrOxNy/Au/TeO2 trilayer for self-cleaning and antifogging coatings applications</atitle><jtitle>Journal of materials science. Materials in electronics</jtitle><stitle>J Mater Sci: Mater Electron</stitle><date>2024-09-01</date><risdate>2024</risdate><volume>35</volume><issue>26</issue><spage>1737</spage><pages>1737-</pages><artnum>1737</artnum><issn>0957-4522</issn><eissn>1573-482X</eissn><abstract>ZrO
x
N
y
monolayer, ZrO
x
N
y
/Au bilayer, ZrO
x
N
y
/Au/TeO
2
trilayer films were investigated for their hydrophilic properties and photocatalytic activities. ZrO
x
N
y
and Au layers were prepared by dc reactive magnetron sputtering whereas TeO
2
layer was prepared by vapor transport technique. X-ray diffraction revealed the formation of monoclinic ZrO
2
phase for ZrO
x
N
y
films with low nitrogen content whereas mixed monoclinic and tetragonal ZrO
2
phases were formed for ZrO
x
N
y
films with higher nitrogen content. The chemical composition of ZrO
x
N
y
bottom layer affected the growth of the Au layer. The tetragonal TeO
2
, in ZrO
x
N
y
/Au/TeO
2
trilayer, blocked most of ZrO
2
and Au crystallographic peaks. The ZrO
x
N
y
/Au films are composed of tiny nanoparticles in the range 27–33 nm and the ZrO
x
N
y
/Au/TeO
2
films have branched-nanowires morphology. ZrO
x
N
y
monolayer films are hydrophilic and the hydrophilicity decreases then increases with increasing the nitrogen content in the film. Adding an Au layer, then TeO
2
layer over ZrO
x
N
y
resulted in a pronounced decrease in water contact angle. After UV-illumination the contact angle of the films became almost zero and the surfaces transformed to super-hydrophilic. Nitrogen doping enhances the degradation rate of ZrO
x
N
y
monolayer film. The highest degradation rate was observed for ZrO
1.9
N
0.3
/Au/TeO
2
trilayer film. The prepared ZrO
x
N
y
/Au/TeO
2
trilayer films are good candidates for self-cleaning and antifogging applications.</abstract><cop>New York</cop><pub>Springer US</pub><doi>10.1007/s10854-024-13489-1</doi><orcidid>https://orcid.org/0000-0002-2612-7697</orcidid></addata></record> |
fulltext | fulltext |
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ispartof | Journal of materials science. Materials in electronics, 2024-09, Vol.35 (26), p.1737, Article 1737 |
issn | 0957-4522 1573-482X |
language | eng |
recordid | cdi_proquest_journals_3106217216 |
source | Springer Nature |
subjects | Bilayers Characterization and Evaluation of Materials Chemical composition Chemistry and Materials Science Cleaning Contact angle Crystallography Degradation Gold Hydrophilicity Magnetic properties Magnetron sputtering Materials Science Monolayers Nanowires Nitrogen Optical and Electronic Materials Photocatalysis Tellurium dioxide Wettability Zirconium dioxide |
title | Surface wettability and photocatalytic activities of ZrOxNy monolayer, ZrOxNy/Au bilayer and ZrOxNy/Au/TeO2 trilayer for self-cleaning and antifogging coatings applications |
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