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Advanced oxidation processes by UV/H2O2 for the removal of anionic surfactants in a decentralized wastewater treatment plant in Ecuador
Surfactants are persistent pollutants that pose risks to ecosystems and human health due to their low removal efficiency in conventional wastewater treatment plants. In Guayaquil, Ecuador, a decentralized facility discharges water with a surfactant concentration that exceeds the national legislation...
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Published in: | Water science and technology 2024-10, Vol.90 (8), p.2340-2351 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | Surfactants are persistent pollutants that pose risks to ecosystems and human health due to their low removal efficiency in conventional wastewater treatment plants. In Guayaquil, Ecuador, a decentralized facility discharges water with a surfactant concentration that exceeds the national legislation up to 20 times. This work aims to demonstrate the effectiveness of the advanced oxidation process UV/H2O2 in removing anionic surfactants as a tertiary treatment for the decentralized facility investigated. A laboratory-scale batch system was tested for the treatment of real effluent with three hydrogen peroxide concentrations (100, 250, and 500 mg L−1) and UV exposure up to 120 min. All experimental trials were run in duplicate. After 60 min of UV exposure with 250 mg L−1 of H2O2, the anionic surfactant removal was 94.3 ± 4.3%, and the effluent complied with the discharge limits ( |
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ISSN: | 0273-1223 1996-9732 |
DOI: | 10.2166/wst.2024.311 |