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Constructing Hierarchical Zeolites with Highly Complete Framework via Controlled Desilication
Desilication in alkaline medium has been widely used in construction of hierarchical zeolites for industrially relevant catalytic processes. The built of hierarchy in zeolites, especially with low aluminum stability or high Si/Al ratio, often suffers from uncontrolled destruction of zeolitic framewo...
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Published in: | Angewandte Chemie 2024-12, Vol.136 (50), p.n/a |
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Main Authors: | , , , , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | Desilication in alkaline medium has been widely used in construction of hierarchical zeolites for industrially relevant catalytic processes. The built of hierarchy in zeolites, especially with low aluminum stability or high Si/Al ratio, often suffers from uncontrolled destruction of zeolitic framework, accompanied by a significant loss of microporous domains and intrinsic acidity after desilication. Here, we report a novel and simple methodology for preparation of hierarchical zeolites with highly complete framework and minimum sacrifice of microporosity and acidity. The pre‐impregnated amines in zeolite micropores act as inner pore‐directing agents (iPDAs), largely protecting the zeolitic framework and moderating the silicon extraction during the alkaline treatment. The resulting hierarchical zeolites exhibit high crystallinity, tunable hierarchy, stable framework, and well‐preserved acidity, endowing them with significantly improved mass transport properties and enhanced activities in catalytic conversion of methanol or furfural.
As compared with the conventional alkaline treatment, iPDAs‐assisted desilication allows to break the porosity and acidity trade‐off and build an efficient and orchestrated hierarchical system in zeolites with highly complete framework, opening new avenues to construction of hierarchical zeolites especially with low aluminum stability or high Si/Al ratio. |
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ISSN: | 0044-8249 1521-3757 |
DOI: | 10.1002/ange.202411446 |