Metal Grating Patterning on Fiber Facets by UV-Based Nano Imprint and Transfer Lithography Using Optical Alignment

UV-based nano imprint and transfer lithography (NITL) is proposed as a flexible, low cost and versatile approach for defining sub-micron metal patterns on optical fiber facets in a single-processing step. NITL relies on a specially prepared mold carrying the pattern that is to be transferred to the...

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Bibliographic Details
Published in:Journal of lightwave technology 2009-05, Vol.27 (10), p.1415-1420
Main Authors: Scheerlinck, Stijn, Dubruel, Peter, Bienstman, Peter, Schacht, Etienne, Van Thourhout, Dries, Baets, Roel
Format: Article
Language:English
Subjects:
Alignment
Applied sciences
Biomedical optical imaging
Circuit properties
Diffraction gratings
Electric, optical and optoelectronic circuits
Electronics
Exact sciences and technology
Fiber gratings
gold grating
Integrated optics. Optical fibers and wave guides
Lithography
Microelectronic fabrication (materials and surfaces technology)
Molds
nano imprint lithography
Nanocomposites
Nanomaterials
Nanostructure
Nanostructures
Optical and optoelectronic circuits
Optical device fabrication
Optical devices
optical fiber
Optical fibers
Optical materials
Optical scattering
Optical sensors
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
silicon-on-insulator
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Description
Summary:UV-based nano imprint and transfer lithography (NITL) is proposed as a flexible, low cost and versatile approach for defining sub-micron metal patterns on optical fiber facets in a single-processing step. NITL relies on a specially prepared mold carrying the pattern that is to be transferred to the facet. The fiber's light-guiding properties allow control of the position of the metal structures by optical alignment.
ISSN:0733-8724
1558-2213
DOI:10.1109/JLT.2008.2004955