Self-Organization Effects in Photopolymerizable Nanocomposite

The main problem of photolithography is to overcome the diffraction limit. A possibility of overcoming this limit by the application of self-writing effects is discussed. Some of these effects are studied in the present work: the self-focusing of light in a photopolymer with a positive change of the...

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Bibliographic Details
Published in:Molecular Crystals and Liquid Crystals 2011-02, Vol.536, p.233
Main Authors: Denisyuk, I Yu, Vorzobova, N D, Burunkova, J E, Arefieva, N N, Fokina, M I
Format: Article
Language:English
Subjects:
Diffraction
Effects
Nanocomposites
Nanoparticles
Offset printing
Polymerization
Polymers
Online Access:Get full text
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Summary:The main problem of photolithography is to overcome the diffraction limit. A possibility of overcoming this limit by the application of self-writing effects is discussed. Some of these effects are studied in the present work: the self-focusing of light in a photopolymer with a positive change of the refractive index, photo-induced transportation of nanoparticles, and the threshold of oxygen-based polymerization. The results of applications of these effects to the lithography process are shown. [PUBLICATION ABSTRACT]
ISSN:1542-1406
1527-1943