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Electrical Characteristics and Thermal Stability of [Formula Omitted] Metal Gate Electrode for Advanced MOS Devices

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Published in:IEEE transactions on electron devices 2008-11, Vol.55 (11), p.3259
Main Authors: Chang-Ta Yang, Chang-Ta Yang, Kuei-Shu Chang-Liao, Kuei-Shu Chang-Liao, Hsin-Chun Chang, Hsin-Chun Chang, Chung-Hao Fu, Chung-Hao Fu, Tien-Ko Wang, Tien-Ko Wang, Wen-Fa Tsai, Wen-Fa Tsai, Chi-Fong Ai, Chi-Fong Ai, Wen-Fa Wu, Wen-Fa Wu
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container_issue 11
container_start_page 3259
container_title IEEE transactions on electron devices
container_volume 55
creator Chang-Ta Yang, Chang-Ta Yang
Kuei-Shu Chang-Liao, Kuei-Shu Chang-Liao
Hsin-Chun Chang, Hsin-Chun Chang
Chung-Hao Fu, Chung-Hao Fu
Tien-Ko Wang, Tien-Ko Wang
Wen-Fa Tsai, Wen-Fa Tsai
Chi-Fong Ai, Chi-Fong Ai
Wen-Fa Wu, Wen-Fa Wu
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doi_str_mv 10.1109/TED.2008.2005128
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title Electrical Characteristics and Thermal Stability of [Formula Omitted] Metal Gate Electrode for Advanced MOS Devices
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