Double-face and submicron two-dimensional domain patterning in congruent lithium niobate

We report on the simultaneous fabrication of two-dimensional submicron engineered domain patterns on both crystal faces, in congruent lithium niobate. The fabrication technique is based on interference photolithography, which allows short pitch over large areas, followed by electric field poling per...

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Bibliographic Details
Published in:IEEE photonics technology letters 2006-02, Vol.18 (3), p.541-543
Main Authors: Grilli, S., Ferraro, P., Sansone, L., Paturzo, M., Sergio De Nicola, Pierattini, G., De Natale, P.
Format: Article
Language:English
Subjects:
Banded structure
Conversion
Crystals
Electric field poling
Engineering physics
Fabrication
Ferroelectric materials
Frequency conversion
Geometry
Interference
interference lithography
Lithium niobate
lithium niobate (LN)
Lithium niobates
Lithography
microstructure fabrication
Nonlinear optics
Optical physics
Optisk fysik
Patterning
Photolithography
Photonic crystals
Photonics
Resists
TECHNOLOGY
TEKNIKVETENSKAP
Teknisk fysik
Two dimensional
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Summary:We report on the simultaneous fabrication of two-dimensional submicron engineered domain patterns on both crystal faces, in congruent lithium niobate. The fabrication technique is based on interference photolithography, which allows short pitch over large areas, followed by electric field poling performed in overpoling regime. Experimental results for different domain pattern geometries, on the two crystal faces, are reported. These structures could be useful for short-wavelength frequency conversion and Bragg gratings applications. The moireacute effect is used in the lithographic process to fabricate more complex structures which could find application in photonic bandgap devices
ISSN:1041-1135
1941-0174
DOI:10.1109/LPT.2005.863626