Micro-porous silicon structure with low optical reflection

A porous silicon structure with good physical and optical characteristics was made by a novel method. In this method, an amorphous silicon film with many fine grains was used as micro-mask. When the sample was subjected to etching process, the presence of fine grain boundaries resulted in selective...

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Bibliographic Details
Published in:Journal of materials science. Materials in electronics 2009-04, Vol.20 (4), p.301-304
Main Authors: Lin, Chiung Wei, Chen, Yi Liang, Lee, Yeong Shyang
Format: Article
Language:English
Subjects:
Applied sciences
Characterization and Evaluation of Materials
Chemistry and Materials Science
Cross-disciplinary physics: materials science
rheology
Electronics
Exact sciences and technology
Materials
Materials Science
Microelectronic fabrication (materials and surfaces technology)
Optical and Electronic Materials
Physics
Porous materials
granular materials
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Silicon wafers
Specific materials
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Summary:A porous silicon structure with good physical and optical characteristics was made by a novel method. In this method, an amorphous silicon film with many fine grains was used as micro-mask. When the sample was subjected to etching process, the presence of fine grain boundaries resulted in selective etching on the surface of silicon wafer. The completed sample showed a low-reflective silicon wafer with a complex morphology. When a light illuminated on this proposed structure, there was nearly no optical reflection to be detected. This indicates that the new porous silicon structure can act as a good light-trapper.
ISSN:0957-4522
1573-482X
DOI:10.1007/s10854-008-9724-z