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High-performance poly-silicon TFTs incorporating LaAlO3 as the gate dielectric
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Published in: | IEEE electron device letters 2005-06, Vol.26 (6), p.384-386 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
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container_end_page | 386 |
container_issue | 6 |
container_start_page | 384 |
container_title | IEEE electron device letters |
container_volume | 26 |
creator | HUNG, B. F CHIANG, K. C HUANG, C. C CHIN, Albert MCALISTER, S. P |
description | |
doi_str_mv | 10.1109/LED.2005.848622 |
format | article |
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ispartof | IEEE electron device letters, 2005-06, Vol.26 (6), p.384-386 |
issn | 0741-3106 1558-0563 |
language | eng |
recordid | cdi_proquest_journals_912072826 |
source | IEEE Electronic Library (IEL) Journals |
subjects | Applied sciences Electronics Exact sciences and technology Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Transistors |
title | High-performance poly-silicon TFTs incorporating LaAlO3 as the gate dielectric |
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