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Demonstration of Distributed Etched Diffraction Grating Demultiplexer
The design principles and measurement results for a compact shallow etched distributed diffraction grating waveguide demultiplexer are presented. The deeply etched diffraction grating facets are replaced with a shallow etched odd-order quarter wavelength Bragg reflector to increase the Fresnel refle...
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Published in: | IEEE photonics journal 2011-08, Vol.3 (4), p.651-657 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The design principles and measurement results for a compact shallow etched distributed diffraction grating waveguide demultiplexer are presented. The deeply etched diffraction grating facets are replaced with a shallow etched odd-order quarter wavelength Bragg reflector to increase the Fresnel reflection coefficient. A prototype device was designed for coarse wavelength demultiplexing applications and was fabricated in nanophotonic silicon-on-insulator platform using deep ultraviolet (DUV) optical lithography. The demultiplexer, which supports four channels with 20-nm channel spacing, shows a crosstalk of -25 dB. |
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ISSN: | 1943-0655 1943-0647 |
DOI: | 10.1109/JPHOT.2011.2159582 |