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Demonstration of Distributed Etched Diffraction Grating Demultiplexer

The design principles and measurement results for a compact shallow etched distributed diffraction grating waveguide demultiplexer are presented. The deeply etched diffraction grating facets are replaced with a shallow etched odd-order quarter wavelength Bragg reflector to increase the Fresnel refle...

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Bibliographic Details
Published in:IEEE photonics journal 2011-08, Vol.3 (4), p.651-657
Main Authors: Jafari, A., Kirk, A. G.
Format: Article
Language:English
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Summary:The design principles and measurement results for a compact shallow etched distributed diffraction grating waveguide demultiplexer are presented. The deeply etched diffraction grating facets are replaced with a shallow etched odd-order quarter wavelength Bragg reflector to increase the Fresnel reflection coefficient. A prototype device was designed for coarse wavelength demultiplexing applications and was fabricated in nanophotonic silicon-on-insulator platform using deep ultraviolet (DUV) optical lithography. The demultiplexer, which supports four channels with 20-nm channel spacing, shows a crosstalk of -25 dB.
ISSN:1943-0655
1943-0647
DOI:10.1109/JPHOT.2011.2159582