Point defects in lithium fluoride by EUV and soft X-rays exposure for X-ray microscopy and optical applications

The extreme ultraviolet radiation emitted by a laser-plasma source or by a capillary discharge laser is applied to the generation of luminescent patterns in lithium fluoride. This novel technique is able to produce colored patterns with high spatial resolution on large (more than 10 cm/sup 2/) areas...

Full description

Saved in:
Bibliographic Details
Published in:IEEE journal of selected topics in quantum electronics 2004-11, Vol.10 (6), p.1435-1445
Main Authors: Baldacchini, G., Bollanti, S., Bonfigli, F., Di Lazzaro, P., Faenov, A.Ya, Flora, F., Marolo, T., Montereali, R.M., Murra, D., Nichelatti, E., Pikuz, T., Reale, A., Reale, L., Ritucci, A., Tomassetti, G.
Format: Article
Language:English
Subjects:
Color centers
detectors
Electron beams
extreme ultraviolet (EUV)
Fault location
imaging
Lithium compounds
lithium fluoride
microlithography
microradiography
microscopy
Optical films
Optical microscopy
soft X-ray
Spatial resolution
Stimulated emission
Ultraviolet sources
Writing
X-ray lasers
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The extreme ultraviolet radiation emitted by a laser-plasma source or by a capillary discharge laser is applied to the generation of luminescent patterns in lithium fluoride. This novel technique is able to produce colored patterns with high spatial resolution on large (more than 10 cm/sup 2/) areas in a short exposure time compared with other irradiation methods like the electron beam writing. The potentials of this technique for applications in photonics are commented. This work reviews the activity performed during the past four years at the ENEA Frascati Center and at L'Aquila University, Italy. Preliminary images of microradiography or X-ray contact microscopy using lithium fluoride as an imaging detector are presented. The advantages of this new detector compared with photographic films or with photoresists are discussed.
ISSN:1077-260X
1558-4542
DOI:10.1109/JSTQE.2004.838080