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Effects of dopant granularity on superhalo-channel MOSFETs according to two- and three-dimensional computer simulations

We have performed two-dimensional (2-D) and three-dimensional (3-D) computer simulations of random dopant fluctuations in 25-nm planar n-channel metal-oxide-semiconductor field effect transistor (MOSFET) with superhalo channel doping. Our study shows that 2-D simulations that neglect lateral percola...

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Bibliographic Details
Published in:IEEE transactions on nanotechnology 2003-06, Vol.2 (2), p.97-101
Main Authors: Voon-Yew Aaron Thean, Sadd, M., White, B.E.
Format: Article
Language:English
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Summary:We have performed two-dimensional (2-D) and three-dimensional (3-D) computer simulations of random dopant fluctuations in 25-nm planar n-channel metal-oxide-semiconductor field effect transistor (MOSFET) with superhalo channel doping. Our study shows that 2-D simulations that neglect lateral percolation of the carriers can overestimate the impact on threshold voltage (V/sub T/) fluctuations by as much as a factor of four. Fundamental differences in the way the 2-D and 3-D models describe subthreshold and near-threshold conduction are highlighted in our study. Our models reveal that surface percolation of carriers is an effective agent for reducing V/sub T/ fluctuations. In addition, the halo only enhances the V/sub T/ fluctuations by approximately 10%. Though the influence of the superhalo in the device may be overwhelmed by atomistic granularity according to the 2-D model, 3-D simulations show that the halo continues to function coherently for the MOSFET ensemble when charge percolation is accounted.
ISSN:1536-125X
1941-0085
DOI:10.1109/TNANO.2003.812587