Glow Characterization in Low-Pressure Radio-Frequency hbox CH 2 hbox F 2 and hbox C 2 hbox H 2 hbox F 4 Plasma Deposition Systems

The glow characteristics and deposited film structures of fluorocarbon monomers in radio-frequency glow discharges are investigated using hbox CH 2 hbox F 2 and hbox C 2 hbox H 2 hbox F 4 , which were compared to hydrocarbon monomer such as hbox CH 4 . The glow was characterized and investigated by...

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Bibliographic Details
Published in:IEEE transactions on plasma science 2011-11, Vol.39 (11), p.2506-2507
Main Authors: Huang, Chun, Lin, Cheng-I, Tsai, Ching-Yuan, Pan, Chien-Hsuan
Format: Article
Language:English
Subjects:
Deposition
Fourier transforms
Hydrocarbons
Infrared
Monomers
Optical emission spectroscopy
Photography
Spectrometry
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Summary:The glow characteristics and deposited film structures of fluorocarbon monomers in radio-frequency glow discharges are investigated using hbox CH 2 hbox F 2 and hbox C 2 hbox H 2 hbox F 4 , which were compared to hydrocarbon monomer such as hbox CH 4 . The glow was characterized and investigated by optical photography, optical emission spectroscopy, and Fourier transform infrared spectrometry. The glow differences were attributed to the nature of the luminous gas phase in respect to polymer-forming species.
ISSN:0093-3813
1939-9375
DOI:10.1109/TPS.2011.2157528