Visible light photo response from N-doped anodic niobium oxide after annealing in ammonia atmosphere

Niobium oxide films with a thickness of approximately 165 nm were prepared by electrochemical anodization. These anodic oxide layers were then treated in an ammonia atmosphere at different temperatures and durations, and characterized with XRD, XPS, ToF-SIMS and photoelectrochemical methods. Under o...

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Bibliographic Details
Published in:Electrochimica acta 2012-02, Vol.62, p.402-407
Main Authors: Ruff, T., Hahn, R., Killian, M.S., Asoh, H., Ono, S., Schmuki, P.
Format: Article
Language:English
Subjects:
Ammonia
Annealing
Anodic
Anodizing
Applied sciences
Atmospheres
Chemistry
Electrochemistry
Energy
Exact sciences and technology
General and physical chemistry
High temperature
Natural energy
Niobium oxide
Niobium oxides
Nitrogen doping
Oxides
Photoelectrochemistry. Electrochemiluminescence
Photovoltaic conversion
Solar cells. Photoelectrochemical cells
Solar energy
X-ray photoelectron spectroscopy
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Summary:Niobium oxide films with a thickness of approximately 165 nm were prepared by electrochemical anodization. These anodic oxide layers were then treated in an ammonia atmosphere at different temperatures and durations, and characterized with XRD, XPS, ToF-SIMS and photoelectrochemical methods. Under optimized conditions nitrogen doping of the niobium oxide films takes place, resulting in a distinct photo response in the visible range of light.
ISSN:0013-4686
1873-3859
DOI:10.1016/j.electacta.2011.12.045