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Influence of annealing temperature on field emission from tetrapod-shaped ZnO-whisker films obtained by screen printing
Tetrapod-shaped zinc oxide whisker-film emitters were fabricated on indium tin oxide glass substrates using a screen-printing method. The influence of annealing temperature on field emission of tetrapod-whisker ZnO-based emitters was investigated. X-ray diffraction and scanning electronic microscopy...
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Published in: | Materials science in semiconductor processing 2010-12, Vol.13 (5), p.400-404 |
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creator | Fan, X.M. Zhang, H.G. Wang, J. Zhou, Z.W. |
description | Tetrapod-shaped zinc oxide whisker-film emitters were fabricated on indium tin oxide glass substrates using a screen-printing method. The influence of annealing temperature on field emission of tetrapod-whisker ZnO-based emitters was investigated. X-ray diffraction and scanning electronic microscopy were applied to characterize the structure and the surface morphology of the deposited films. It was found that ZnO-based emitters annealed at 250
°C have the best field emission properties with the lowest turn-on field of 2.6
V/μm at a current density of 1
μA/cm
2, the lowest threshold field of 5.2
V/μm at a current density of 1
mA/cm
2 and high field emission enhancement factor of 4129. Moreover, films with homogeneous, fine and dense light spots with low emission current fluctuation of 1.7% were obtained from samples annealed at 250
°C.
► TW-ZnO-based emitters fabricated by screen-printing method. ► Annealing temperature influences field emission properties. ► The highest field emission enhancement factor was obtained at about 250
°C annealing. ► Annealing temperature influences light spots density and emission current fluctuation. |
doi_str_mv | 10.1016/j.mssp.2011.05.012 |
format | article |
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°C have the best field emission properties with the lowest turn-on field of 2.6
V/μm at a current density of 1
μA/cm
2, the lowest threshold field of 5.2
V/μm at a current density of 1
mA/cm
2 and high field emission enhancement factor of 4129. Moreover, films with homogeneous, fine and dense light spots with low emission current fluctuation of 1.7% were obtained from samples annealed at 250
°C.
► TW-ZnO-based emitters fabricated by screen-printing method. ► Annealing temperature influences field emission properties. ► The highest field emission enhancement factor was obtained at about 250
°C annealing. ► Annealing temperature influences light spots density and emission current fluctuation.</description><identifier>ISSN: 1369-8001</identifier><identifier>EISSN: 1873-4081</identifier><identifier>DOI: 10.1016/j.mssp.2011.05.012</identifier><language>eng</language><publisher>Kidlington: Elsevier Ltd</publisher><subject>Annealing ; Applied sciences ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Current density ; Electron and ion emission by liquids and solids; impact phenomena ; Electronics ; Emitters ; Exact sciences and technology ; Field emission ; Field emission, ionization, evaporation, and desorption ; Field enhancement factor ; Heat treatment ; Indium tin oxide ; Materials science ; Metals. Metallurgy ; Microstructure ; Physics ; Production techniques ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Semiconductors ; Solid surfaces and solid-solid interfaces ; Surface structure and topography ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Vacuum microelectronics ; X-ray diffraction ; ZnO whisker</subject><ispartof>Materials science in semiconductor processing, 2010-12, Vol.13 (5), p.400-404</ispartof><rights>2011 Elsevier Ltd</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c363t-d17278c9c790f204f4ced9d3ffedc38b4ba3987ee1bd0a8b3eab727291573db33</citedby><cites>FETCH-LOGICAL-c363t-d17278c9c790f204f4ced9d3ffedc38b4ba3987ee1bd0a8b3eab727291573db33</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=25290334$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Fan, X.M.</creatorcontrib><creatorcontrib>Zhang, H.G.</creatorcontrib><creatorcontrib>Wang, J.</creatorcontrib><creatorcontrib>Zhou, Z.W.</creatorcontrib><title>Influence of annealing temperature on field emission from tetrapod-shaped ZnO-whisker films obtained by screen printing</title><title>Materials science in semiconductor processing</title><description>Tetrapod-shaped zinc oxide whisker-film emitters were fabricated on indium tin oxide glass substrates using a screen-printing method. The influence of annealing temperature on field emission of tetrapod-whisker ZnO-based emitters was investigated. X-ray diffraction and scanning electronic microscopy were applied to characterize the structure and the surface morphology of the deposited films. It was found that ZnO-based emitters annealed at 250
°C have the best field emission properties with the lowest turn-on field of 2.6
V/μm at a current density of 1
μA/cm
2, the lowest threshold field of 5.2
V/μm at a current density of 1
mA/cm
2 and high field emission enhancement factor of 4129. Moreover, films with homogeneous, fine and dense light spots with low emission current fluctuation of 1.7% were obtained from samples annealed at 250
°C.
► TW-ZnO-based emitters fabricated by screen-printing method. ► Annealing temperature influences field emission properties. ► The highest field emission enhancement factor was obtained at about 250
°C annealing. ► Annealing temperature influences light spots density and emission current fluctuation.</description><subject>Annealing</subject><subject>Applied sciences</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Current density</subject><subject>Electron and ion emission by liquids and solids; impact phenomena</subject><subject>Electronics</subject><subject>Emitters</subject><subject>Exact sciences and technology</subject><subject>Field emission</subject><subject>Field emission, ionization, evaporation, and desorption</subject><subject>Field enhancement factor</subject><subject>Heat treatment</subject><subject>Indium tin oxide</subject><subject>Materials science</subject><subject>Metals. Metallurgy</subject><subject>Microstructure</subject><subject>Physics</subject><subject>Production techniques</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Semiconductors</subject><subject>Solid surfaces and solid-solid interfaces</subject><subject>Surface structure and topography</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Vacuum microelectronics</subject><subject>X-ray diffraction</subject><subject>ZnO whisker</subject><issn>1369-8001</issn><issn>1873-4081</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNp9kE1r3DAQhk1JoJtN_kBPugRysTuS_Am9hNC0gUAu7SUXIUujrja27Gq8XfbfV2ZDjz1JYp53RvNk2ScOBQdef94XI9FcCOC8gKoALj5kG942Mi-h5RfpLusubwH4x-yKaA8AleD1Jjs-BTccMBhkk2M6BNSDD7_YguOMUS-HmAqBOY-DZTh6Ir8-4zQmZIl6nmxOOz2jZa_hJT_uPL1hTPwwEpv6RfuQSv2JkYmIgc3RhyUNuM4unR4Ib97Pbfbz8euPh-_588u3p4f759zIWi655Y1oWtOZpgMnoHSlQdtZ6RxaI9u-7LXs2gaR9xZ020vUfUqIjleNtL2U2-zu3HeO0-8D0qLSDgaHQQecDqQ4CNFWNa94QsUZNXEiiuhU-uyo4ylBarWs9mq1rFbLCiqVLKfQ7Xt_TUYPLupgPP1Likp0IGWZuC9nDtOyfzxGRcav2q2PaBZlJ_-_MX8B01qV5g</recordid><startdate>20101215</startdate><enddate>20101215</enddate><creator>Fan, X.M.</creator><creator>Zhang, H.G.</creator><creator>Wang, J.</creator><creator>Zhou, Z.W.</creator><general>Elsevier Ltd</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20101215</creationdate><title>Influence of annealing temperature on field emission from tetrapod-shaped ZnO-whisker films obtained by screen printing</title><author>Fan, X.M. ; Zhang, H.G. ; Wang, J. ; Zhou, Z.W.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c363t-d17278c9c790f204f4ced9d3ffedc38b4ba3987ee1bd0a8b3eab727291573db33</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Annealing</topic><topic>Applied sciences</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Current density</topic><topic>Electron and ion emission by liquids and solids; impact phenomena</topic><topic>Electronics</topic><topic>Emitters</topic><topic>Exact sciences and technology</topic><topic>Field emission</topic><topic>Field emission, ionization, evaporation, and desorption</topic><topic>Field enhancement factor</topic><topic>Heat treatment</topic><topic>Indium tin oxide</topic><topic>Materials science</topic><topic>Metals. Metallurgy</topic><topic>Microstructure</topic><topic>Physics</topic><topic>Production techniques</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Semiconductors</topic><topic>Solid surfaces and solid-solid interfaces</topic><topic>Surface structure and topography</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Vacuum microelectronics</topic><topic>X-ray diffraction</topic><topic>ZnO whisker</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Fan, X.M.</creatorcontrib><creatorcontrib>Zhang, H.G.</creatorcontrib><creatorcontrib>Wang, J.</creatorcontrib><creatorcontrib>Zhou, Z.W.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Materials science in semiconductor processing</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Fan, X.M.</au><au>Zhang, H.G.</au><au>Wang, J.</au><au>Zhou, Z.W.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Influence of annealing temperature on field emission from tetrapod-shaped ZnO-whisker films obtained by screen printing</atitle><jtitle>Materials science in semiconductor processing</jtitle><date>2010-12-15</date><risdate>2010</risdate><volume>13</volume><issue>5</issue><spage>400</spage><epage>404</epage><pages>400-404</pages><issn>1369-8001</issn><eissn>1873-4081</eissn><abstract>Tetrapod-shaped zinc oxide whisker-film emitters were fabricated on indium tin oxide glass substrates using a screen-printing method. The influence of annealing temperature on field emission of tetrapod-whisker ZnO-based emitters was investigated. X-ray diffraction and scanning electronic microscopy were applied to characterize the structure and the surface morphology of the deposited films. It was found that ZnO-based emitters annealed at 250
°C have the best field emission properties with the lowest turn-on field of 2.6
V/μm at a current density of 1
μA/cm
2, the lowest threshold field of 5.2
V/μm at a current density of 1
mA/cm
2 and high field emission enhancement factor of 4129. Moreover, films with homogeneous, fine and dense light spots with low emission current fluctuation of 1.7% were obtained from samples annealed at 250
°C.
► TW-ZnO-based emitters fabricated by screen-printing method. ► Annealing temperature influences field emission properties. ► The highest field emission enhancement factor was obtained at about 250
°C annealing. ► Annealing temperature influences light spots density and emission current fluctuation.</abstract><cop>Kidlington</cop><pub>Elsevier Ltd</pub><doi>10.1016/j.mssp.2011.05.012</doi><tpages>5</tpages></addata></record> |
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subjects | Annealing Applied sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Current density Electron and ion emission by liquids and solids impact phenomena Electronics Emitters Exact sciences and technology Field emission Field emission, ionization, evaporation, and desorption Field enhancement factor Heat treatment Indium tin oxide Materials science Metals. Metallurgy Microstructure Physics Production techniques Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Semiconductors Solid surfaces and solid-solid interfaces Surface structure and topography Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Vacuum microelectronics X-ray diffraction ZnO whisker |
title | Influence of annealing temperature on field emission from tetrapod-shaped ZnO-whisker films obtained by screen printing |
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