Deposition of photocatalytically active TiO sub(2) films by inkjet printing of TiO sub(2) nanoparticle suspensions obtained from microwave-assisted hydrothermal synthesis

• Published in: Nanotechnology 2012-04, Vol.23 (16), p.165603-1-10
• Main Authors: Arin, M, Lommens, P, Hopkins, S C, Pollefeyt, G, Van der Eycken, J, Ricart, S, Granados, X, Glowacki, BA, Van Driessche, I
• Format: Article
• Language: English
• Subjects: Deposition; Heat treatment; Inkjet printing; Nanoparticles; Nanostructure; Photocatalysis; Roughness; Titanium dioxide
• ISSN: 0957-4484
• DOI: 10.1088/0957-4484/23/16/165603

In this paper, we present an inkjet printing approach suited for the deposition of photocatalytically active, transparent titanium oxide coatings from an aqueous, colloidal suspension. We used a bottom-up approach in which a microwave-assisted hydrothermal treatment of titanium propoxide aqueous solutions in the presence of ethylenediaminetetraacetic acid and triethanolamine was used to create suspensions containing titania nanoparticles. Different inkjet printing set-ups, electromagnetic and piezoelectric driven, were tested to deposit the inks on glass substrates. The presence of preformed titania nanoparticles was expected to make it possible to reduce the heating temperature necessary to obtain the functionality of photocatalysis which can widen the application range of the approach to heat-sensitive substrates. We investigated the crystallinity and size of the obtained nanoparticles by electron microscopy and dynamic light scattering. The rheological properties of the suspensions were evaluated against the relevant criteria for inkjet printing and the jettability was analyzed. The photocatalytic activity of the obtained layers was analyzed by following the decomposition of a methylene blue solution under UV illumination. The influence of the heat treatment temperature on the film roughness, thickness and photocatalytic activity was studied. Good photocatalytic performance was achieved for heat treatments at temperatures as low as 150 degree C, introducing the possibility of using this approach for heat-sensitive substrates.