Top-down patterning of zeolitic imidazolate framework composite thin films by deep X-ray lithography

For the first time a top-down process was used to control the spatial location of Metal-Organic Frameworks on a surface. Deep X-ray lithography was utilised to micropattern a Zeolitic Imidazolate Framework layer on a sol-gel surface, with exposure hardening the sol-gel by inducing crosslinking while...

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Bibliographic Details
Published in:Chemical communications (Cambridge, England) England), 2012-01, Vol.48 (60), p.7483-7485
Main Authors: Dimitrakakis, Constantinos, Marmiroli, Benedetta, Amenitsch, Heinz, Malfatti, Luca, Innocenzi, Plinio, Grenci, Gianluca, Vaccari, Lisa, Hill, Anita J, Ladewig, Bradley P, Hill, Matthew R, Falcaro, Paolo
Format: Article
Language:English
Subjects:
Crosslinking
Hardening
Lithography
Patterning
Position (location)
Sol gel process
Thin films
X-rays
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Summary:For the first time a top-down process was used to control the spatial location of Metal-Organic Frameworks on a surface. Deep X-ray lithography was utilised to micropattern a Zeolitic Imidazolate Framework layer on a sol-gel surface, with exposure hardening the sol-gel by inducing crosslinking while leaving the frameworks intact.
ISSN:1359-7345
1364-548X
DOI:10.1039/c2cc33292b