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Preparation of Ga2Se3 thin films by sol–gel technique

In this study we describe the preparation of Ga 2 Se 3 semiconductor compound thin films by sol–gel method for different crystal formation temperatures. The films were characterized by X-ray diffraction analyses (XRD), UV–visible spectrometer, and scanning electron microscope (SEM). The XRD spectrum...

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Bibliographic Details
Published in:Journal of sol-gel science and technology 2009-06, Vol.50 (3), p.271-274
Main Authors: Mutlu, Ibrahim H., Zarbaliyev, Maharram Z., Aslan, Ferhat
Format: Article
Language:English
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Summary:In this study we describe the preparation of Ga 2 Se 3 semiconductor compound thin films by sol–gel method for different crystal formation temperatures. The films were characterized by X-ray diffraction analyses (XRD), UV–visible spectrometer, and scanning electron microscope (SEM). The XRD spectrum showed that the formation of Ga 2 Se 3 crystals were between 743 and 823 K. The thin film crystals that were formed at 773 K corresponded to the β phase and the preferred crystal structure was monoclinic. The value of band gap from optical absorption spectra for the Ga 2 Se 3 thin films was estimated to be about E g  ~ 2.56 eV. The thickness of the one-coat Ga 2 Se 3 thin films, which was measured by a Spectroscopic Ellipsometer, was about ~200 nm. The average grain sizes of scattered particles were within the limits between 200 and 500 nm.
ISSN:0928-0707
1573-4846
DOI:10.1007/s10971-009-1973-7