Gradual tilting exposure photo and nano lithography technique

We report a novel tilting exposure photolithography (TEL) technique where gradual pattern displacement is employed to achieve high-resolution features over large areas with reasonable exposure times. A linear array with features of the order of 100 nm has been realized using this technique with stan...

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Bibliographic Details
Published in:Applied optics (2004) 2012-06, Vol.51 (16), p.3329-3337
Main Authors: Kolahdouz, Z, Koohsorkhi, J, Cheraghi, M A, Saviz, M, Mohajerzadeh, S
Format: Article
Language:English
Subjects:
Arrays
Linear arrays
Lithography
Nanocomposites
Nanomaterials
Nanostructure
Photolithography
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Summary:We report a novel tilting exposure photolithography (TEL) technique where gradual pattern displacement is employed to achieve high-resolution features over large areas with reasonable exposure times. A linear array with features of the order of 100 nm has been realized using this technique with standard blue-light LED sources. TEL can be useful in the visible and ultraviolet spectra to create two-dimensional periodic structures. The created structures include the nanometric array of spots and lines. The proposed technique can be used as a writing method where complex features can be generated by moving the sample-holding leading to serpentine nanometric linear arrays.
ISSN:1559-128X
2155-3165
DOI:10.1364/AO.51.003329