Design and fabrication of optical filters with very large stopband (≈500nm) and small passband (1nm) in silicon-on-insulator

► Modeling with a genetic algorithm (GA) was used to investigate the effect of changing the number of periods and thickness ratios of a photonic crystal filter structure. ► We used the determined optimum parameters at a wavelength of 1550nm to fabricate the structure. ► Experimental results show tha...

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Bibliographic Details
Published in:Photonics and nanostructures 2012-10, Vol.10 (4), p.447-451
Main Authors: Jia, Wei, Deng, Jun, Reid, Benjamin P.L., Wang, Xu, Chan, Christopher C.S., Wu, Hong, Li, Xiangyin, Taylor, Robert A., Danner, Aaron J.
Format: Article
Language:English
Subjects:
Bandwidth
Broadband
Exact sciences and technology
Filters, zone plates, and polarizers
Fundamental areas of phenomenology (including applications)
Genetic algorithms
Heterostructures
Inductively coupled plasma
Mathematical models
Nanostructure
Optical elements, devices, and systems
Optical materials
Optics
Photonic bandgap materials
Photonic crystal filter
Photonic crystals
Photonics
Physics
Wavelengths
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Summary:► Modeling with a genetic algorithm (GA) was used to investigate the effect of changing the number of periods and thickness ratios of a photonic crystal filter structure. ► We used the determined optimum parameters at a wavelength of 1550nm to fabricate the structure. ► Experimental results show that the structure indeed has a very narrow transmission window and a low loss of just 4dB. In this paper, we report on the design, fabrication and characterization of a broadband photonic crystal filter. Modeling with a genetic algorithm (GA) was used to investigate the effect of changing the number of periods and thickness ratios of a photonic crystal filter structure with two alternating materials. Theoretical optimized parameters were obtained as a function of wavelength for a photonic crystal filter with a very broad filter bandwidth as well as a very narrow transmission window. We used the determined optimum parameters at a wavelength of 1550nm to fabricate the structure using e-beam lithography and inductively coupled plasma (ICP) etching. Experimental results show that the structure indeed has a very narrow transmission window and a low loss of just 4dB. Hence, this structure can be regarded as a high precision filter for optical communication and photonic integrated chip technologies.
ISSN:1569-4410
1569-4429
DOI:10.1016/j.photonics.2012.02.001