Loading…
Tunneling Atomic Force Microscopy Studies on Surface Growth Pits Due to Dislocations in 4H-SiC Epitaxial Layers
The morphological and electrical properties of surface growth pits caused by dislocations in 4H-SiC epitaxial layers were characterized using tunneling atomic force microscopy. The characteristic distribution of the tip current between the metal-coated atomic force microscopy tip and the SiC was obs...
Saved in:
Published in: | Journal of electronic materials 2012-08, Vol.41 (8), p.2193-2196 |
---|---|
Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c379t-ad8496197afaaf20135f22126638c170291d4040c6a51ef18accbb9d693a14fa3 |
---|---|
cites | cdi_FETCH-LOGICAL-c379t-ad8496197afaaf20135f22126638c170291d4040c6a51ef18accbb9d693a14fa3 |
container_end_page | 2196 |
container_issue | 8 |
container_start_page | 2193 |
container_title | Journal of electronic materials |
container_volume | 41 |
creator | Ohtani, Noboru Ushio, Shoji Kaneko, Tadaaki Aigo, Takashi Katsuno, Masakazu Fujimoto, Tatsuo Ohashi, Wataru |
description | The morphological and electrical properties of surface growth pits caused by dislocations in 4H-SiC epitaxial layers were characterized using tunneling atomic force microscopy. The characteristic distribution of the tip current between the metal-coated atomic force microscopy tip and the SiC was observed within a large surface growth pit caused by a threading screw dislocation. The current was highly localized inside the pit and occurred only on the inclined surface in the up-step direction near the pit bottom. This paper discusses the causes and possible mechanisms of the observed tip current distribution inside surface growth pits. |
doi_str_mv | 10.1007/s11664-012-2133-3 |
format | article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1266709927</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1266709927</sourcerecordid><originalsourceid>FETCH-LOGICAL-c379t-ad8496197afaaf20135f22126638c170291d4040c6a51ef18accbb9d693a14fa3</originalsourceid><addsrcrecordid>eNp1kU1rGzEQhkVoIW6aH5CboBR6UaqRtNrdY3C-Ci4tOIHcxESWUoW15EpaWv_77OJQSqGnOczzPgzzEnIG_Bw4bz8XAK0V4yCYACmZPCILaJRk0OmHN2TBpQbWCNkck3elPHMODXSwIOlujNENIT7Ri5q2wdLrlK2jX4PNqdi029N1HTfBFZoiXY_Z47S9yelX_UG_h1ro5ehoTfQylCFZrCHFQkOk6patw5Je7ULF3wEHusK9y-U9eetxKO70dZ6Q--uru-UtW327-bK8WDEr274y3HSq19C36BG94CAbLwQIrWVnoeWih43iiluNDTgPHVr7-NhvdC8RlEd5Qj4dvLucfo6uVLMNxbphwOjSWMysannfi3ZCP_yDPqcxx-k6A1wIobRu-ETBgZr_UrLzZpfDFvN-gsxcgTlUYKYKzFyBkVPm46sZi8XBZ4w2lD9BoaHjSsxuceDKtIpPLv99wf_kLw7wlLk</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1022246650</pqid></control><display><type>article</type><title>Tunneling Atomic Force Microscopy Studies on Surface Growth Pits Due to Dislocations in 4H-SiC Epitaxial Layers</title><source>Springer Link</source><creator>Ohtani, Noboru ; Ushio, Shoji ; Kaneko, Tadaaki ; Aigo, Takashi ; Katsuno, Masakazu ; Fujimoto, Tatsuo ; Ohashi, Wataru</creator><creatorcontrib>Ohtani, Noboru ; Ushio, Shoji ; Kaneko, Tadaaki ; Aigo, Takashi ; Katsuno, Masakazu ; Fujimoto, Tatsuo ; Ohashi, Wataru</creatorcontrib><description>The morphological and electrical properties of surface growth pits caused by dislocations in 4H-SiC epitaxial layers were characterized using tunneling atomic force microscopy. The characteristic distribution of the tip current between the metal-coated atomic force microscopy tip and the SiC was observed within a large surface growth pit caused by a threading screw dislocation. The current was highly localized inside the pit and occurred only on the inclined surface in the up-step direction near the pit bottom. This paper discusses the causes and possible mechanisms of the observed tip current distribution inside surface growth pits.</description><identifier>ISSN: 0361-5235</identifier><identifier>EISSN: 1543-186X</identifier><identifier>DOI: 10.1007/s11664-012-2133-3</identifier><identifier>CODEN: JECMA5</identifier><language>eng</language><publisher>Boston: Springer US</publisher><subject>Atomic force microscopy ; Characterization and Evaluation of Materials ; Chemistry and Materials Science ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Crystal dislocations ; Crystal surfaces ; Defects and impurities in crystals; microstructure ; Defects and impurities: doping, implantation, distribution, concentration, etc ; Dislocations ; Electrical properties ; Electronic materials ; Electronics and Microelectronics ; Epitaxial layers ; Exact sciences and technology ; Instrumentation ; Linear defects: dislocations, disclinations ; Materials Science ; Methods of deposition of films and coatings; film growth and epitaxy ; Microscopy ; Optical and Electronic Materials ; Physics ; Pits ; Silicon carbide ; Solid State Physics ; Structure and morphology; thickness ; Structure of solids and liquids; crystallography ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Theory and models of film growth ; Thin film structure and morphology ; Tunneling</subject><ispartof>Journal of electronic materials, 2012-08, Vol.41 (8), p.2193-2196</ispartof><rights>TMS 2012</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c379t-ad8496197afaaf20135f22126638c170291d4040c6a51ef18accbb9d693a14fa3</citedby><cites>FETCH-LOGICAL-c379t-ad8496197afaaf20135f22126638c170291d4040c6a51ef18accbb9d693a14fa3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=26180420$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Ohtani, Noboru</creatorcontrib><creatorcontrib>Ushio, Shoji</creatorcontrib><creatorcontrib>Kaneko, Tadaaki</creatorcontrib><creatorcontrib>Aigo, Takashi</creatorcontrib><creatorcontrib>Katsuno, Masakazu</creatorcontrib><creatorcontrib>Fujimoto, Tatsuo</creatorcontrib><creatorcontrib>Ohashi, Wataru</creatorcontrib><title>Tunneling Atomic Force Microscopy Studies on Surface Growth Pits Due to Dislocations in 4H-SiC Epitaxial Layers</title><title>Journal of electronic materials</title><addtitle>Journal of Elec Materi</addtitle><description>The morphological and electrical properties of surface growth pits caused by dislocations in 4H-SiC epitaxial layers were characterized using tunneling atomic force microscopy. The characteristic distribution of the tip current between the metal-coated atomic force microscopy tip and the SiC was observed within a large surface growth pit caused by a threading screw dislocation. The current was highly localized inside the pit and occurred only on the inclined surface in the up-step direction near the pit bottom. This paper discusses the causes and possible mechanisms of the observed tip current distribution inside surface growth pits.</description><subject>Atomic force microscopy</subject><subject>Characterization and Evaluation of Materials</subject><subject>Chemistry and Materials Science</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Crystal dislocations</subject><subject>Crystal surfaces</subject><subject>Defects and impurities in crystals; microstructure</subject><subject>Defects and impurities: doping, implantation, distribution, concentration, etc</subject><subject>Dislocations</subject><subject>Electrical properties</subject><subject>Electronic materials</subject><subject>Electronics and Microelectronics</subject><subject>Epitaxial layers</subject><subject>Exact sciences and technology</subject><subject>Instrumentation</subject><subject>Linear defects: dislocations, disclinations</subject><subject>Materials Science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Microscopy</subject><subject>Optical and Electronic Materials</subject><subject>Physics</subject><subject>Pits</subject><subject>Silicon carbide</subject><subject>Solid State Physics</subject><subject>Structure and morphology; thickness</subject><subject>Structure of solids and liquids; crystallography</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Theory and models of film growth</subject><subject>Thin film structure and morphology</subject><subject>Tunneling</subject><issn>0361-5235</issn><issn>1543-186X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNp1kU1rGzEQhkVoIW6aH5CboBR6UaqRtNrdY3C-Ci4tOIHcxESWUoW15EpaWv_77OJQSqGnOczzPgzzEnIG_Bw4bz8XAK0V4yCYACmZPCILaJRk0OmHN2TBpQbWCNkck3elPHMODXSwIOlujNENIT7Ri5q2wdLrlK2jX4PNqdi029N1HTfBFZoiXY_Z47S9yelX_UG_h1ro5ehoTfQylCFZrCHFQkOk6patw5Je7ULF3wEHusK9y-U9eetxKO70dZ6Q--uru-UtW327-bK8WDEr274y3HSq19C36BG94CAbLwQIrWVnoeWih43iiluNDTgPHVr7-NhvdC8RlEd5Qj4dvLucfo6uVLMNxbphwOjSWMysannfi3ZCP_yDPqcxx-k6A1wIobRu-ETBgZr_UrLzZpfDFvN-gsxcgTlUYKYKzFyBkVPm46sZi8XBZ4w2lD9BoaHjSsxuceDKtIpPLv99wf_kLw7wlLk</recordid><startdate>20120801</startdate><enddate>20120801</enddate><creator>Ohtani, Noboru</creator><creator>Ushio, Shoji</creator><creator>Kaneko, Tadaaki</creator><creator>Aigo, Takashi</creator><creator>Katsuno, Masakazu</creator><creator>Fujimoto, Tatsuo</creator><creator>Ohashi, Wataru</creator><general>Springer US</general><general>Springer</general><general>Springer Nature B.V</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>3V.</scope><scope>7XB</scope><scope>88I</scope><scope>8AF</scope><scope>8AO</scope><scope>8FE</scope><scope>8FG</scope><scope>8FK</scope><scope>8G5</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>ARAPS</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>GNUQQ</scope><scope>GUQSH</scope><scope>HCIFZ</scope><scope>KB.</scope><scope>L6V</scope><scope>M2O</scope><scope>M2P</scope><scope>M7S</scope><scope>MBDVC</scope><scope>P5Z</scope><scope>P62</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>PTHSS</scope><scope>Q9U</scope><scope>S0X</scope><scope>7QQ</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20120801</creationdate><title>Tunneling Atomic Force Microscopy Studies on Surface Growth Pits Due to Dislocations in 4H-SiC Epitaxial Layers</title><author>Ohtani, Noboru ; Ushio, Shoji ; Kaneko, Tadaaki ; Aigo, Takashi ; Katsuno, Masakazu ; Fujimoto, Tatsuo ; Ohashi, Wataru</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c379t-ad8496197afaaf20135f22126638c170291d4040c6a51ef18accbb9d693a14fa3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Atomic force microscopy</topic><topic>Characterization and Evaluation of Materials</topic><topic>Chemistry and Materials Science</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Crystal dislocations</topic><topic>Crystal surfaces</topic><topic>Defects and impurities in crystals; microstructure</topic><topic>Defects and impurities: doping, implantation, distribution, concentration, etc</topic><topic>Dislocations</topic><topic>Electrical properties</topic><topic>Electronic materials</topic><topic>Electronics and Microelectronics</topic><topic>Epitaxial layers</topic><topic>Exact sciences and technology</topic><topic>Instrumentation</topic><topic>Linear defects: dislocations, disclinations</topic><topic>Materials Science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Microscopy</topic><topic>Optical and Electronic Materials</topic><topic>Physics</topic><topic>Pits</topic><topic>Silicon carbide</topic><topic>Solid State Physics</topic><topic>Structure and morphology; thickness</topic><topic>Structure of solids and liquids; crystallography</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Theory and models of film growth</topic><topic>Thin film structure and morphology</topic><topic>Tunneling</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ohtani, Noboru</creatorcontrib><creatorcontrib>Ushio, Shoji</creatorcontrib><creatorcontrib>Kaneko, Tadaaki</creatorcontrib><creatorcontrib>Aigo, Takashi</creatorcontrib><creatorcontrib>Katsuno, Masakazu</creatorcontrib><creatorcontrib>Fujimoto, Tatsuo</creatorcontrib><creatorcontrib>Ohashi, Wataru</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>ProQuest Central (Corporate)</collection><collection>ProQuest Central (purchase pre-March 2016)</collection><collection>Science Database (Alumni Edition)</collection><collection>STEM Database</collection><collection>ProQuest Pharma Collection</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>ProQuest Central (Alumni) (purchase pre-March 2016)</collection><collection>Research Library (Alumni Edition)</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central (Alumni)</collection><collection>ProQuest Central</collection><collection>Advanced Technologies & Aerospace Collection</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>ProQuest Central Student</collection><collection>Research Library Prep</collection><collection>SciTech Premium Collection</collection><collection>https://resources.nclive.org/materials</collection><collection>ProQuest Engineering Collection</collection><collection>ProQuest Research Library</collection><collection>Science Database</collection><collection>Engineering Database</collection><collection>Research Library (Corporate)</collection><collection>ProQuest advanced technologies & aerospace journals</collection><collection>ProQuest Advanced Technologies & Aerospace Collection</collection><collection>Materials science collection</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>Engineering collection</collection><collection>ProQuest Central Basic</collection><collection>SIRS Editorial</collection><collection>Ceramic Abstracts</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of electronic materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ohtani, Noboru</au><au>Ushio, Shoji</au><au>Kaneko, Tadaaki</au><au>Aigo, Takashi</au><au>Katsuno, Masakazu</au><au>Fujimoto, Tatsuo</au><au>Ohashi, Wataru</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Tunneling Atomic Force Microscopy Studies on Surface Growth Pits Due to Dislocations in 4H-SiC Epitaxial Layers</atitle><jtitle>Journal of electronic materials</jtitle><stitle>Journal of Elec Materi</stitle><date>2012-08-01</date><risdate>2012</risdate><volume>41</volume><issue>8</issue><spage>2193</spage><epage>2196</epage><pages>2193-2196</pages><issn>0361-5235</issn><eissn>1543-186X</eissn><coden>JECMA5</coden><abstract>The morphological and electrical properties of surface growth pits caused by dislocations in 4H-SiC epitaxial layers were characterized using tunneling atomic force microscopy. The characteristic distribution of the tip current between the metal-coated atomic force microscopy tip and the SiC was observed within a large surface growth pit caused by a threading screw dislocation. The current was highly localized inside the pit and occurred only on the inclined surface in the up-step direction near the pit bottom. This paper discusses the causes and possible mechanisms of the observed tip current distribution inside surface growth pits.</abstract><cop>Boston</cop><pub>Springer US</pub><doi>10.1007/s11664-012-2133-3</doi><tpages>4</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0361-5235 |
ispartof | Journal of electronic materials, 2012-08, Vol.41 (8), p.2193-2196 |
issn | 0361-5235 1543-186X |
language | eng |
recordid | cdi_proquest_miscellaneous_1266709927 |
source | Springer Link |
subjects | Atomic force microscopy Characterization and Evaluation of Materials Chemistry and Materials Science Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Crystal dislocations Crystal surfaces Defects and impurities in crystals microstructure Defects and impurities: doping, implantation, distribution, concentration, etc Dislocations Electrical properties Electronic materials Electronics and Microelectronics Epitaxial layers Exact sciences and technology Instrumentation Linear defects: dislocations, disclinations Materials Science Methods of deposition of films and coatings film growth and epitaxy Microscopy Optical and Electronic Materials Physics Pits Silicon carbide Solid State Physics Structure and morphology thickness Structure of solids and liquids crystallography Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Theory and models of film growth Thin film structure and morphology Tunneling |
title | Tunneling Atomic Force Microscopy Studies on Surface Growth Pits Due to Dislocations in 4H-SiC Epitaxial Layers |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T09%3A16%3A32IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Tunneling%20Atomic%20Force%20Microscopy%20Studies%20on%20Surface%20Growth%20Pits%20Due%20to%20Dislocations%20in%204H-SiC%20Epitaxial%20Layers&rft.jtitle=Journal%20of%20electronic%20materials&rft.au=Ohtani,%20Noboru&rft.date=2012-08-01&rft.volume=41&rft.issue=8&rft.spage=2193&rft.epage=2196&rft.pages=2193-2196&rft.issn=0361-5235&rft.eissn=1543-186X&rft.coden=JECMA5&rft_id=info:doi/10.1007/s11664-012-2133-3&rft_dat=%3Cproquest_cross%3E1266709927%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c379t-ad8496197afaaf20135f22126638c170291d4040c6a51ef18accbb9d693a14fa3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=1022246650&rft_id=info:pmid/&rfr_iscdi=true |