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Dark Current Characteristics of a Radiation Detector Array Developed Using MOVPE-Grown Thick CdTe Layers on Si Substrate

We present reverse bias current (dark current) characteristics of a two-dimensional monolithic pixel-type nuclear radiation detector array fabricated using metalorganic vapor-phase epitaxy (MOVPE)-grown thick CdTe epitaxial layers on Si substrate. The (14 × 8) pixel array was formed by cutting deep...

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Bibliographic Details
Published in:Journal of electronic materials 2012-10, Vol.41 (10), p.2754-2758
Main Authors: Yasuda, K., Niraula, M., Fujimura, N., Tachi, T., Inuzuka, H., Namba, S., Muramatsu, S., Kondo, T., Agata, Y.
Format: Article
Language:English
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Summary:We present reverse bias current (dark current) characteristics of a two-dimensional monolithic pixel-type nuclear radiation detector array fabricated using metalorganic vapor-phase epitaxy (MOVPE)-grown thick CdTe epitaxial layers on Si substrate. The (14 × 8) pixel array was formed by cutting deep vertical trenches using a dicing saw, where each pixel possesses a p -CdTe/ n -CdTe/ n + -Si heterojunction diode structure. The dark currents showed pixel-to-pixel variations when measured at higher applied biases exceeding 100 V. The dark current had a dependence on the pixel thickness, where pixels with lower CdTe thickness exhibited higher currents. Moreover, the temperature dependence of the dark current revealed that a deep level with activation energy of around 0.6 eV is responsible for the observed dark currents and their pixel-to-pixel variation. We discuss that the effective ratio of Te to Cd at the growth surface is a major factor that controls the thickness variation, and is also responsible for the formation of 0.6 eV deep levels.
ISSN:0361-5235
1543-186X
DOI:10.1007/s11664-012-2121-7