Microstructure, mechanical and tribological properties of CrWN films deposited by DC magnetron sputtering

Chromium tungsten nitride (CrWN) films were deposited on silicon substrates using a d.c. magnetron reactive co-sputtering technique equipped with 45° dual guns of Cr and W targets. The morphology and microstructure of the films were investigated by scanning electron microscopy (SEM), X-ray diffracti...

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Bibliographic Details
Published in:Vacuum 2013-01, Vol.87, p.209-212
Main Authors: Wu, Wan-Yu, Wu, Chia-Hao, Xiao, Bo-Hong, Yang, Ting-Xin, Lin, Shi-Yi, Chen, Ping-Hung, Chang, Chi-Lung
Format: Article
Language:English
Subjects:
Chromium
Chromium tungsten nitride (CrWN) coating
Deposition
Friction coefficient
Magnetron sputtering
Microstructure
Nanocomposite
Nanocomposites
Nanomaterials
Nanostructure
Scanning electron microscopy
Tribology
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Summary:Chromium tungsten nitride (CrWN) films were deposited on silicon substrates using a d.c. magnetron reactive co-sputtering technique equipped with 45° dual guns of Cr and W targets. The morphology and microstructure of the films were investigated by scanning electron microscopy (SEM), X-ray diffraction (XRD), high resolution transmission electron microscopy (HRTEM), and electron probe micro-analyses (EPMA). The mechanical and tribological properties were evaluated using a nanoindentor and a conventional ball-on-disk tribometer, respectively. The as-deposited films have nanocomposite microstructure which CrN is the main crystalline constituent inside. The nanocomposite CrWN films exhibit a low surface roughness (Ra 
ISSN:0042-207X
1879-2715
DOI:10.1016/j.vacuum.2012.01.026