Double electric layer influence on dynamic of EUV radiation from plasma of high-current pulse diode in tin vapor

Generation of high-power pulses of extreme ultraviolet radiation from multi-charged tin plasma is of great interest to many applications. We studied the electric potential distribution in the discharge gap in kind of the electric double layer and its effect on the extreme ultraviolet generation. The...

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Bibliographic Details
Published in:Physics letters. A 2013-01, Vol.377 (3-4), p.307-309
Main Authors: Borgun, I.V., Azarenkov, N.A., Hassanein, A., Tseluyko, A.F., Maslov, V.I., Ryabchikov, D.L.
Format: Article
Language:English
Subjects:
Diodes
Discharge produced plasma
Double electric layer
Double layer
Electric double layer
Electric potential
Electric power generation
EUV radiation
Plasma (physics)
Solid state physics
Tin
z-Pinch
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Summary:Generation of high-power pulses of extreme ultraviolet radiation from multi-charged tin plasma is of great interest to many applications. We studied the electric potential distribution in the discharge gap in kind of the electric double layer and its effect on the extreme ultraviolet generation. The local plasma heating by electron beam, formed in the double layer, leads to generation of peak radiation pulses and as a result to an increase in the radiation power. ► The EUV multi-spike radiation has been obtained from high-current pulse plasma diode. ► The generating EUV multi-spike radiation is due to the beam-plasma heating. ► The plasma has been heated by electron beam formed in the double electric layer. ► The area of beam-plasma heating has a small size. ► The double layer is always formed near the small work surface electrode.
ISSN:0375-9601
1873-2429
DOI:10.1016/j.physleta.2012.11.027