Evolution of Ag nanocrystal films grown by pulsed laser deposition

We have conducted the first experiments under identical thermal, background, and surface preparation conditions to compare metal-on-insulator growth morphology in Pulsed Laser Deposition (PLD) and Physical Vapor Deposition (PVD). Such films deposited from a thermal vapor are known to exhibit a chara...

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Bibliographic Details
Published in:Applied physics. A, Materials science & processing Materials science & processing, 2004-09, Vol.79 (4-6), p.713-716
Main Authors: WARRENDER, J. M, AZIZ, M. J
Format: Article
Language:English
Subjects:
Computer simulation
Cross-disciplinary physics: materials science
rheology
Deposition
Evolution
Exact sciences and technology
Laser deposition
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Monte Carlo methods
Morphology
Nanocrystalline materials
Nanoscale materials and structures: fabrication and characterization
Percolation
Physical vapor deposition
Physics
Pulsed laser deposition
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Summary:We have conducted the first experiments under identical thermal, background, and surface preparation conditions to compare metal-on-insulator growth morphology in Pulsed Laser Deposition (PLD) and Physical Vapor Deposition (PVD). Such films deposited from a thermal vapor are known to exhibit a characteristic morphological progression beginning with isolated three-dimensional islands and ending with a percolating, continuous film that conducts electrically. We have studied this progression for Pulsed Laser Deposition, a technique that differs from PVD in that depositing species arrive in short bursts (
ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-004-2573-6