A simple and scalable route to wafer-size patterned graphene

Producing large-scale graphene films with controllable patterns is an essential component of graphene-based nanodevice fabrication. Current methods of graphene pattern preparation involve either high cost, low throughput patterning processes or sophisticated instruments, hindering their large-scale...

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Bibliographic Details
Published in:Journal of materials chemistry 2010-06, Vol.2 (24), p.541-546
Main Authors: Liu, Li-Hong, Zorn, Gilad, Castner, David G, Solanki, Raj, Lerner, Michael M, Yan, Mingdi
Format: Article
Language:English
Subjects:
Graphene
Nanocomposites
Nanomaterials
Nanostructure
Patterning
Photolithography
Silicon substrates
Stability
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Summary:Producing large-scale graphene films with controllable patterns is an essential component of graphene-based nanodevice fabrication. Current methods of graphene pattern preparation involve either high cost, low throughput patterning processes or sophisticated instruments, hindering their large-scale fabrication and practical applications. We report a simple, effective, and reproducible approach for patterning graphene films with controllable feature sizes and shapes. The patterns were generated using a versatile photocoupling chemistry. Features from micrometres to centimetres were fabricated using a conventional photolithography process. This method is simple, general, and applicable to a wide range of substrates including silicon wafers, glass slides, and metal films. Graphene patterns with controllable feature sizes and shapes have been fabricated via a simple, effective, and reproducible lithography process. The approach applies to various substrates, and is induced by a fast and tunable light activation.
ISSN:0959-9428
1364-5501
1364-5501
DOI:10.1039/c0jm00509f