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Anatase TiO2 films fabricated by pulsed laser deposition using Ti target
TiO 2 films were prepared by pulsed laser deposition using a metallic Ti target in an O 2 gas ambient. The microstructure along with optical and photocatalytic properties of the deposited films were systematically studied by changing the deposition parameters and substrates. It was found that TiO 2...
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Published in: | Applied physics. A, Materials science & processing Materials science & processing, 2009-02, Vol.94 (2), p.275-280 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | TiO
2
films were prepared by pulsed laser deposition using a metallic Ti target in an O
2
gas ambient. The microstructure along with optical and photocatalytic properties of the deposited films were systematically studied by changing the deposition parameters and substrates. It was found that TiO
2
films having nearly pure anatase phase grew effectively in O
2
atmosphere. When the films were fabricated at a substrate temperature of 400°C, their phase structures were greatly affected by the O
2
gas pressure, and nearly pure anatase phase with typical (101) and (004) peaks can be obtained under an O
2
pressure of 15 Pa. For the deposition at 700°C, the crystal structure of the TiO
2
films exhibited a strong anatase (004) peak and was inert to the oxygen pressures. Two modes, namely a substrate-temperature-controlled mode and an oxygen-pressure-controlled mode, were considered for the growth of the anatase TiO
2
films under different substrate temperatures. In addition, the optical and photocatalytic properties were found to be sensitive to both the microstructure and grain size of the TiO
2
films. |
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ISSN: | 0947-8396 1432-0630 |
DOI: | 10.1007/s00339-008-4767-9 |