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Anatase TiO2 films fabricated by pulsed laser deposition using Ti target

TiO 2 films were prepared by pulsed laser deposition using a metallic Ti target in an O 2 gas ambient. The microstructure along with optical and photocatalytic properties of the deposited films were systematically studied by changing the deposition parameters and substrates. It was found that TiO 2...

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Bibliographic Details
Published in:Applied physics. A, Materials science & processing Materials science & processing, 2009-02, Vol.94 (2), p.275-280
Main Authors: Xu, Y., Shen, M. R.
Format: Article
Language:English
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Summary:TiO 2 films were prepared by pulsed laser deposition using a metallic Ti target in an O 2 gas ambient. The microstructure along with optical and photocatalytic properties of the deposited films were systematically studied by changing the deposition parameters and substrates. It was found that TiO 2 films having nearly pure anatase phase grew effectively in O 2 atmosphere. When the films were fabricated at a substrate temperature of 400°C, their phase structures were greatly affected by the O 2 gas pressure, and nearly pure anatase phase with typical (101) and (004) peaks can be obtained under an O 2 pressure of 15 Pa. For the deposition at 700°C, the crystal structure of the TiO 2 films exhibited a strong anatase (004) peak and was inert to the oxygen pressures. Two modes, namely a substrate-temperature-controlled mode and an oxygen-pressure-controlled mode, were considered for the growth of the anatase TiO 2 films under different substrate temperatures. In addition, the optical and photocatalytic properties were found to be sensitive to both the microstructure and grain size of the TiO 2 films.
ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-008-4767-9