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Characterization of a template process for conducting cluster-assembled wires
Bismuth and antimony clusters have been deposited onto spin coated PMMA layers patterned by electron-beam exposure. The probability of reflection or adhesion of the clusters from the PMMA depended on its surface roughness, determined by the electron-beam exposure dose. The Bi and Sb clusters exhibit...
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Published in: | Applied physics. A, Materials science & processing Materials science & processing, 2009-11, Vol.97 (2), p.315-321 |
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creator | Reichel, R. Partridge, J. G. Brown, S. A. |
description | Bismuth and antimony clusters have been deposited onto spin coated PMMA layers patterned by electron-beam exposure. The probability of reflection or adhesion of the clusters from the PMMA depended on its surface roughness, determined by the electron-beam exposure dose. The Bi and Sb clusters exhibited a significantly higher probability of reflection from unexposed PMMA than from Si
3
N
4
(grown by plasma enhanced chemical vapor deposition) despite the approximately equal surface roughness of these layers. By exploiting this difference in adhesion/reflection, a cluster-assembled wire was grown between four-point planar electrodes. Four-probe electrical measurements yielded linear current-voltage (
I
(
V
)) characteristics whilst non-linear
I
(
V
) characteristics were obtained from two-probe measurements. An established model provided good agreement with two-probe conductance-voltage and resistance-temperature data. Tunneling barriers between the cluster wire and the planar electrodes are believed to have caused the non-linear two-point
I
(
V
) characteristics. |
doi_str_mv | 10.1007/s00339-009-5385-x |
format | article |
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3
N
4
(grown by plasma enhanced chemical vapor deposition) despite the approximately equal surface roughness of these layers. By exploiting this difference in adhesion/reflection, a cluster-assembled wire was grown between four-point planar electrodes. Four-probe electrical measurements yielded linear current-voltage (
I
(
V
)) characteristics whilst non-linear
I
(
V
) characteristics were obtained from two-probe measurements. An established model provided good agreement with two-probe conductance-voltage and resistance-temperature data. Tunneling barriers between the cluster wire and the planar electrodes are believed to have caused the non-linear two-point
I
(
V
) characteristics.</description><identifier>ISSN: 0947-8396</identifier><identifier>EISSN: 1432-0630</identifier><identifier>DOI: 10.1007/s00339-009-5385-x</identifier><language>eng</language><publisher>Berlin/Heidelberg: Springer-Verlag</publisher><subject>Adhesion ; Antimony ; Characterization and Evaluation of Materials ; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) ; Clusters ; Condensed Matter Physics ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; Electric wire ; Electrodes ; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures ; Electronic transport in multilayers, nanoscale materials and structures ; Exact sciences and technology ; Machines ; Manufacturing ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Methods of nanofabrication ; Nanocrystalline materials ; Nanopowders ; Nanoscale materials and structures: fabrication and characterization ; Nanoscale pattern formation ; Nanotechnology ; Nonlinearity ; Optical and Electronic Materials ; Physics ; Physics and Astronomy ; Polymethyl methacrylates ; Processes ; Reflection ; Surfaces and Interfaces ; Thin Films</subject><ispartof>Applied physics. A, Materials science & processing, 2009-11, Vol.97 (2), p.315-321</ispartof><rights>Springer-Verlag 2009</rights><rights>2009 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c351t-2fd51c0405e0dea32de2c21c3c460aa62bea1a818ebde4797e28b9d1d651da203</citedby><cites>FETCH-LOGICAL-c351t-2fd51c0405e0dea32de2c21c3c460aa62bea1a818ebde4797e28b9d1d651da203</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=21943314$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Reichel, R.</creatorcontrib><creatorcontrib>Partridge, J. G.</creatorcontrib><creatorcontrib>Brown, S. A.</creatorcontrib><title>Characterization of a template process for conducting cluster-assembled wires</title><title>Applied physics. A, Materials science & processing</title><addtitle>Appl. Phys. A</addtitle><description>Bismuth and antimony clusters have been deposited onto spin coated PMMA layers patterned by electron-beam exposure. The probability of reflection or adhesion of the clusters from the PMMA depended on its surface roughness, determined by the electron-beam exposure dose. The Bi and Sb clusters exhibited a significantly higher probability of reflection from unexposed PMMA than from Si
3
N
4
(grown by plasma enhanced chemical vapor deposition) despite the approximately equal surface roughness of these layers. By exploiting this difference in adhesion/reflection, a cluster-assembled wire was grown between four-point planar electrodes. Four-probe electrical measurements yielded linear current-voltage (
I
(
V
)) characteristics whilst non-linear
I
(
V
) characteristics were obtained from two-probe measurements. An established model provided good agreement with two-probe conductance-voltage and resistance-temperature data. Tunneling barriers between the cluster wire and the planar electrodes are believed to have caused the non-linear two-point
I
(
V
) characteristics.</description><subject>Adhesion</subject><subject>Antimony</subject><subject>Characterization and Evaluation of Materials</subject><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</subject><subject>Clusters</subject><subject>Condensed Matter Physics</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Electric wire</subject><subject>Electrodes</subject><subject>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</subject><subject>Electronic transport in multilayers, nanoscale materials and structures</subject><subject>Exact sciences and technology</subject><subject>Machines</subject><subject>Manufacturing</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Methods of nanofabrication</subject><subject>Nanocrystalline materials</subject><subject>Nanopowders</subject><subject>Nanoscale materials and structures: fabrication and characterization</subject><subject>Nanoscale pattern formation</subject><subject>Nanotechnology</subject><subject>Nonlinearity</subject><subject>Optical and Electronic Materials</subject><subject>Physics</subject><subject>Physics and Astronomy</subject><subject>Polymethyl methacrylates</subject><subject>Processes</subject><subject>Reflection</subject><subject>Surfaces and Interfaces</subject><subject>Thin Films</subject><issn>0947-8396</issn><issn>1432-0630</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNp9kD1PwzAQhi0EEqXwA9iyILEYzh9JkxFVfElFLDBbF_tSUqVJ8SWi8OtJ1YoRLzf4fR_dPUJcKrhRALNbBjCmkACFTE2eyu2RmChrtITMwLGYQGFnMjdFdirOmFcwPqv1RLzMPzCi7ynWP9jXXZt0VYJJT-tNgz0lm9h5Yk6qLia-a8Pg-7pdJr4ZeOxIZKZ12VBIvupIfC5OKmyYLg5zKt4f7t_mT3Lx-vg8v1tIb1LVS12FVHmwkBIEQqMDaa-VN95mgJjpklBhrnIqA9lZMSOdl0VQIUtVQA1mKq733HG9z4G4d-uaPTUNttQN7JTOTZZbbewYVfuojx1zpMptYr3G-O0UuJ06t1fnRnVup85tx87VAY_ssakitr7mv6JWhTVG7dh6n-Pxq11SdKtuiO14-T_wX50ogBA</recordid><startdate>20091101</startdate><enddate>20091101</enddate><creator>Reichel, R.</creator><creator>Partridge, J. 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A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c351t-2fd51c0405e0dea32de2c21c3c460aa62bea1a818ebde4797e28b9d1d651da203</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Adhesion</topic><topic>Antimony</topic><topic>Characterization and Evaluation of Materials</topic><topic>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</topic><topic>Clusters</topic><topic>Condensed Matter Physics</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Electric wire</topic><topic>Electrodes</topic><topic>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</topic><topic>Electronic transport in multilayers, nanoscale materials and structures</topic><topic>Exact sciences and technology</topic><topic>Machines</topic><topic>Manufacturing</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Methods of nanofabrication</topic><topic>Nanocrystalline materials</topic><topic>Nanopowders</topic><topic>Nanoscale materials and structures: fabrication and characterization</topic><topic>Nanoscale pattern formation</topic><topic>Nanotechnology</topic><topic>Nonlinearity</topic><topic>Optical and Electronic Materials</topic><topic>Physics</topic><topic>Physics and Astronomy</topic><topic>Polymethyl methacrylates</topic><topic>Processes</topic><topic>Reflection</topic><topic>Surfaces and Interfaces</topic><topic>Thin Films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Reichel, R.</creatorcontrib><creatorcontrib>Partridge, J. G.</creatorcontrib><creatorcontrib>Brown, S. A.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied physics. A, Materials science & processing</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Reichel, R.</au><au>Partridge, J. G.</au><au>Brown, S. A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Characterization of a template process for conducting cluster-assembled wires</atitle><jtitle>Applied physics. A, Materials science & processing</jtitle><stitle>Appl. Phys. A</stitle><date>2009-11-01</date><risdate>2009</risdate><volume>97</volume><issue>2</issue><spage>315</spage><epage>321</epage><pages>315-321</pages><issn>0947-8396</issn><eissn>1432-0630</eissn><abstract>Bismuth and antimony clusters have been deposited onto spin coated PMMA layers patterned by electron-beam exposure. The probability of reflection or adhesion of the clusters from the PMMA depended on its surface roughness, determined by the electron-beam exposure dose. The Bi and Sb clusters exhibited a significantly higher probability of reflection from unexposed PMMA than from Si
3
N
4
(grown by plasma enhanced chemical vapor deposition) despite the approximately equal surface roughness of these layers. By exploiting this difference in adhesion/reflection, a cluster-assembled wire was grown between four-point planar electrodes. Four-probe electrical measurements yielded linear current-voltage (
I
(
V
)) characteristics whilst non-linear
I
(
V
) characteristics were obtained from two-probe measurements. An established model provided good agreement with two-probe conductance-voltage and resistance-temperature data. Tunneling barriers between the cluster wire and the planar electrodes are believed to have caused the non-linear two-point
I
(
V
) characteristics.</abstract><cop>Berlin/Heidelberg</cop><pub>Springer-Verlag</pub><doi>10.1007/s00339-009-5385-x</doi><tpages>7</tpages></addata></record> |
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source | Springer Nature:Jisc Collections:Springer Nature Read and Publish 2023-2025: Springer Reading List |
subjects | Adhesion Antimony Characterization and Evaluation of Materials Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Clusters Condensed Matter Physics Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Electric wire Electrodes Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Electronic transport in multilayers, nanoscale materials and structures Exact sciences and technology Machines Manufacturing Materials science Methods of deposition of films and coatings film growth and epitaxy Methods of nanofabrication Nanocrystalline materials Nanopowders Nanoscale materials and structures: fabrication and characterization Nanoscale pattern formation Nanotechnology Nonlinearity Optical and Electronic Materials Physics Physics and Astronomy Polymethyl methacrylates Processes Reflection Surfaces and Interfaces Thin Films |
title | Characterization of a template process for conducting cluster-assembled wires |
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