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Laser-induced nano-patterning by means of interference subpatterns generated by microspheres

Interference patterns generated by a regular lattice of SiO2 microspheres on a transparent support are used for the surface patterning of polyimide (PI) foils. Using 248 nm excimer-laser radiation, thousands to millions of holes with a full width at half maximum (FWHM) of 160c40 nm can be generated...

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Bibliographic Details
Published in:Applied physics. A, Materials science & processing Materials science & processing, 2003-01, Vol.76 (1), p.1-3
Main Authors: Denk, R., Piglmayer, K., Bäuerle, D.
Format: Article
Language:English
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Summary:Interference patterns generated by a regular lattice of SiO2 microspheres on a transparent support are used for the surface patterning of polyimide (PI) foils. Using 248 nm excimer-laser radiation, thousands to millions of holes with a full width at half maximum (FWHM) of 160c40 nm can be generated with a single laser pulse.
ISSN:0947-8396
1432-0630
DOI:10.1007/s003390201413