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An Investigation on the Optimization and Scaling of Complementary SiGe HBTs
We use predictive technology computer-aided design to investigate the device design challenges and optimization issues that will be necessarily encountered in scaling of complementary silicon-germanium (C-SiGe) heterojunction bipolar transistors (HBTs). A fully integrated simulation framework was de...
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Published in: | IEEE transactions on electron devices 2013-01, Vol.60 (1), p.34-41 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | We use predictive technology computer-aided design to investigate the device design challenges and optimization issues that will be necessarily encountered in scaling of complementary silicon-germanium (C-SiGe) heterojunction bipolar transistors (HBTs). A fully integrated simulation framework was developed to design and optimize device doping and Ge profiles for any given target performance, using important circuit-relevant figures-of-merit. This methodology was successfully utilized to realize device profiles for multiple C-SiGe technology nodes within the context of a C-SiGe scaling roadmap. A method for optimizing the ac performance of SiGe HBTs geared for both high-performance and low-power applications is also presented. The performance metrics of the optimized profiles presented here are then compared with those of existing fabricated devices reported in the literature. |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2012.2225838 |